There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.
公开了磺酸前体组合物,以及使用这些组合物进行光刻等方法。还公开了其他实施例。
US8168694B2
申请人:——
公开号:US8168694B2
公开(公告)日:2012-05-01
US8501382B1
申请人:——
公开号:US8501382B1
公开(公告)日:2013-08-06
Hoshi, Nobuto; Sato, Kazuhiro; Uda, Hisashi, Journal of Chemical Research, Miniprint, 1984, # 12, p. 3501 - 3596