1-(4-chlorophenyl)ethanesulfonic acid

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1-(4-chlorophenyl)ethanesulfonic acid
• 化学式: C₈H₉ClO₃S
• 分子量: 220.677
• InChiKey: DZUNAKBWXZWPFD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  3

上下游信息

• 上游原料

  中文名称	英文名称	CAS号	化学式	分子量
  ——	1-(4-chlorophenyl)-ethanethiol	113682-50-1	C8H9ClS	172.678

反应信息

• 作为产物：
  描述：

  1-氯-4-(1-氯乙基)苯 在 potassium permanganate 、 sodium disulfide 、 四丁基硫酸氢铵 作用下， 生成 1-(4-chlorophenyl)ethanesulfonic acid
  参考文献：
  名称：

  一种1-芳基乙磺酸及其衍生物的制备方法

  摘要：

  本发明提供了一种1‑芳基乙磺酸及其衍生物的制备方法，包括以下步骤：A)式(Ⅰ)所示的1‑芳基卤代乙烷和硫氢化钠反应生成1‑芳基乙硫醇；B)1‑芳基乙硫醇进行氧化反应，得到1‑芳基乙磺酸。本发明以1‑芳基卤代乙烷为原料，通过与硫氢化钠反应制备1‑芳基乙硫醇，再经氧化得1‑芳基乙磺酸，本方法操作简单，反应条件温和，原料便宜，成本低，收率和纯度较高，是制备1‑芳基乙磺酸的良好工艺。而且溶剂可以回收套用，能够减轻环保压力，溶剂中含水量的大小不影响反应的进行程度且不会有水解副反应的发生；氯代的芳基化合物即可与硫氢化钠反应，且具有较高收率，不需要制备出溴代的芳基化合物，可大幅度降低成本，收率高于现有工艺水平。

  公开号：

  CN107721886B

文献信息

• PROCESS FOR PRODUCING ESTER COMPOUND
  申请人：Imazeki Shigeaki

  公开号：US20100324314A1

  公开（公告）日：2010-12-23

  PROBLEM To provide an environmentally-friendly method for producing industrially an ester compound. SOLUTION The present invention is a method for producing an ester compound which comprises subjecting a carboxylic acid and an alcohol to dehydration-condensation reaction using an involatile acid catalyst and then removing the residual acid catalyst by bringing a weak basic substance into contact with the residual acid catalyst.

  问题提供一种生产工业酯化合物的环保方法。 解决方案是一种生产酯化合物的方法，包括将羧酸和醇经过脱水缩合反应，使用一种不挥发的酸催化剂，然后通过将弱碱性物质与残留的酸催化剂接触来去除残留的酸催化剂。
• Heterocycle-bearing onium salts
  申请人：Ishihara Masami

  公开号：US20050233253A1

  公开（公告）日：2005-10-20

  The present invention relates to a heterocycle-containing onium salt useful as, for example, a cationic photopolymerization initiator and an acid generator for a chemically amplified resist, and provides “a heterocycle-containing onium salt shown by the general formula [1]: [wherein R is a group shown by the general formula [2]: (wherein R 3 and R 4 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; X 2 is an oxygen atom or a sulfur atom; i is an integer of 0 to 4; and j is an integer of 0 to 3), or a group shown by the general formula [3]: (wherein R 5 and R 6 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; X 3 and X 4 are each independently an oxygen atom or a sulfur atom; p is an integer of 0 to 2; and q is an integer of 0 to 3); R 1 and R 2 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; m and n are each independently an integer of 0 to 5; and A is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]: HM 1 (R 7 ) 4 [4] (wherein M 1 is a boron atom or a gallium atom; and R 7 is an aryl group which may have a substituent selected from a lower haloalkyl group, a halogen atom, a nitro group and a cyano group)]” or “a heterocycle-containing onium salt shown by the general formula [35]: [wherein R 26 and R 27 are each independently an aryl group which may have a halogen atom or a lower alkyl group as a substituent, a group shown by the above-mentioned general formula [2], or a group shown by the above-mentioned general formula [3]; and A 3 is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]; and provided that at least one of R 26 and R 27 is a group shown by the above-mentioned general formula [2] or [3], and when only one of R 26 and R 27 is a group shown by the above-mentioned general formula [2] or [3], A 3 is an anion derived from an inorganic strong acid shown by the general formula [36]; HM 3 F 6 [36] (wherein M 3 is a phosphorus atom, an arsenic atom or an antimony atom), an organic acid or a compound shown by the general formula [4]]”.

  本发明涉及一种含杂环离子盐，例如，用作阳离子光聚合引发剂和化学增感抗蚀剂的酸发生剂，并提供“一种由通式[1]所示的含杂环离子盐：[其中R是由通式[2]所示的基团：（其中R3和R4分别独立地是卤素原子，可能具有卤素原子或芳基取代基的烷基基团，或可能具有卤素原子或较低烷基基团的芳基基团；X2是氧原子或硫原子；i是0到4的整数；j是0到3的整数），或由通式[3]所示的基团：（其中R5和R6分别独立地是卤素原子，可能具有卤素原子或芳基取代基的烷基基团，或可能具有卤素原子或较低烷基基团的芳基基团；X3和X4分别独立地是氧原子或硫原子；p是0到2的整数；q是0到3的整数）；R1和R2分别独立地是卤素原子，可能具有卤素原子或芳基取代基的烷基基团，或可能具有卤素原子或较低烷基基团的芳基基团；m和n分别独立地是0到5的整数；A是从无机强酸，有机酸或由通式[4]所示的化合物得到的卤素离子或阴离子：HM1（R7）4[4]（其中M1是硼原子或镓原子；R7是可能选择自较低卤代烷基基团、卤素原子、硝基基团和氰基团的芳基基团）]”或“一种由通式[35]所示的含杂环离子盐：[其中R26和R27分别独立地是可能具有卤素原子或较低烷基基团的芳基基团，上述通式[2]所示的基团或上述通式[3]所示的基团；A3是从无机强酸，有机酸或由通式[4]所示的化合物得到的卤素离子或阴离子；并且至少其中之一的R26和R27是上述通式[2]或[3]所示的基团，当仅R26和R27中的一个是上述通式[2]或[3]所示的基团时，A3是从通式[36]所示的无机强酸得到的阴离子：HM3F6[36]（其中M3是磷原子、砷原子或锑原子），有机酸或由通式[4]所示的化合物]”。
• Process for producing triarylsulfonium salt
  申请人：Sumino Motoshige

  公开号：US20070083060A1

  公开（公告）日：2007-04-12

  [Subject] To provide a method for effectively producing a triarylsulfonium salt having a structure that only one aromatic ring of three aromatic rings on the cation portion thereof is different from the other two aromatic rings (hereinafter, abbreviated as a triarylsulfonium salt relating to the present invention) in a high yield without forming any byproduct. [Means for Solution Problems] The present invention relates to a method for producing a triarylsulfonium salt represented by the general formula [4]: wherein, two R 1 's represent each hydrogen atom, halogen atom, alkyl group, lower haloalkyl group, alkoxy group, acyl group, hydroxyl group, amino group, nitro group or cyano group; R represents an aryl group which may have a substituent selected from a halogen atom, an alkyl group, a lower haloalkyl group, an alkoxy group, an alkylthio group, a N-alkylcarbamoyl group and a carbamoyl group, and the above substituent is different from one represented by the above R 1 ; and A 1 represents a strong acid residue, comprising reacting a diaryl sulfoxide represented by the general formula [1]: wherein, R 1 represents the same as above, and an aryl Grignard reagent represented by the general formula [2]: RMgX   [2] wherein, X represents a halogen atom; R represents the same as above, in the presence of an activator with high affinity for oxygen of 3 to 7.5 equivalents relative to the above diaryl sulfoxide, and then reacting the resultant reaction mixture with a strong acid represented by the general formula [3]: HA 1 [3] wherein, A 1 represents the same as above, or a salt thereof.

  [主题] 提供一种有效地生产三芳基硫鎓盐的方法，其结构中阳离子部分的三个芳环中仅有一个芳环与另外两个芳环不同（以下简称与本发明有关的三芳基硫鎓盐），高产率地生产三芳基硫鎓盐而不产生任何副产物。 [解决问题的方法] 本发明涉及一种生产由一般式[4]表示的三芳基硫鎓盐的方法： 其中，两个R1分别代表氢原子、卤素原子、烷基、较低的卤代烷基、烷氧基、酰基、羟基、氨基、硝基或氰基；R代表芳基，该芳基可以具有从卤素原子、烷基、较低的卤代烷基、烷氧基、烷硫基、N-烷基氨甲酰基和氨甲酰基中选择的取代基，上述取代基与上述R1所代表的取代基不同；A1代表强酸残基。 该方法包括在高亲氧活化剂存在下，使一由一般式[1]表示的二芳基亚砜： 其中，R1代表与上述相同，以及由一般式[2]表示的芳基格氏试剂反应： RMgX   [2] 其中，X代表卤素原子；R代表与上述相同，然后将所得反应混合物与一由一般式[3]表示的强酸： HA1[3] 其中，A1代表与上述相同或其盐反应。
• HETEROCYCLE-BEARING ONIUM SALTS
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1481973B1

  公开（公告）日：2008-12-31
• PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1676835B1

  公开（公告）日：2014-12-10