[EN] HIGHLY SELECTIVE NOVEL AMIDATION METHOD<br/>[FR] PROCÉDÉ D'UNE NOUVELLE AMIDATION TRÈS SÉLECTIVE
申请人:TAKEDA PHARMACEUTICAL
公开号:WO2005121133A1
公开(公告)日:2005-12-22
The present invention provides an industrial production method with a short process having a high yield of an aliphatic cyclic carboxamide having carboxyl group, which comprises reacting functional group-selectively using an inexpensive condensing agent without protecting the carboxyl group by esterification, that is, reacting carboxylic acid anhydride obtained by reacting carboxylic acid and tertiary carboxylic acid halide with aliphatic cyclic secondary amine having carboxyl group.
Addition of cyclic amines to α,β-unsaturated acids via the aza-Michael reaction
作者:H. N. Khachatryan、G. A. Bagdasaryan、S. S. Hayotsyan、O. S. Attaryan、G. G. Danagulyan
DOI:10.1134/s1070363216080302
日期:2016.8
Addition of Cyclic Amines to α,β-Unsaturated Acids via the Aza-Michael Reaction H. N. Khachatryan, G. А. Bagdasaryan, S. S. Hayotsyan, O. S. Attaryan, and G. G. Danagulyan a Institute of Organic Chemistry, Scientific-Technological Center of Organic and Pharmaceutical Chemistry, National Academy of Sciences of Armenia Azatutyan ave. 26, Yerevan, 0014 Armenia *e-mail: hasmikjasmin1@gmail.com b Russian-Armenian
The present invention provides an industrial production method with a short process having a high yield of an aliphatic cyclic carboxamide having carboxyl group, which comprises reacting functional group-selectively using an inexpensive condensing agent without protecting the carboxyl group by esterification, that is, reacting carboxylic acid anhydride obtained by reacting carboxylic acid and tertiary carboxylic acid halide with aliphatic cyclic secondary amine having carboxyl group.
PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION
申请人:HATAKEYAMA Jun
公开号:US20090053657A1
公开(公告)日:2009-02-26
A pattern is formed by applying a first positive resist composition comprising a polymer comprising recurring units which become alkali soluble under the action of acid onto a substrate to form a first resist coating, heat treating, exposing, heat treating, developing to form a first resist pattern, applying a pattern surface coating composition comprising a hydroxyl-containing crosslinkable polymer onto the first resist pattern and crosslinking, thereby covering the first resist pattern with a crosslinked polymer film, applying a second positive resist composition thereon, heat treating, exposing, heat treating, and developing to form a second resist pattern.