申请人:Fujisawa Pharmaceutical Co., Ltd.
公开号:US04921855A1
公开(公告)日:1990-05-01
A compound of the formula: ##STR1## wherein R.sup.1 is lower alkyl optionally substituted with a substituent selected from the group consisting of acyl, hydroxy, lower alkoxy, aryl, lower alkylthio and a group of the formula: ##STR2## in which R.sup.5 is hydrogen or acyl and R.sup.6 is hydrogen or lower alkyl; aryl; or amino optionally substituted with substituent(s) selected from the group consisting of lower alkyl and acyl; and R.sup.2 is hydrogen or lower alkyl; or R.sup.1 and R.sup.2 are taken together with the attached nitrogen atom to form a heterocyclic group optionally substituted with substituent(s) selected from the group consisting of lower alkyl, hydroxy(lower )alkyl, lower alkoxy(lower)alkyl, acyl(lower)alkyl, oxo and acyl; R.sup.3 is hydrogen or lower alkyl; and R.sup.4 is lower alkyl; and its pharmaceutically acceptable salt, processes for the preparation thereof and pharmaceutical composition comprising the same.
该化合物的化学式如下:##STR1##其中R.sup.1是选择自酰基、羟基、较低烷氧基、芳基、较低烷硫基和化学式组成的取代基的较低烷基,其中R.sup.5是氢或酰基,R.sup.6是氢或较低烷基;芳基;或氨基,可选择地带有来自较低烷基和酰基的取代基,R.sup.2是氢或较低烷基;或R.sup.1和R.sup.2与相连的氮原子一起形成可选择地带有来自较低烷基、羟基(较低)烷基、较低烷氧基(较低)烷基、酰基(较低)烷基、氧代基和酰基的取代基的杂环基;R.sup.3是氢或较低烷基;R.sup.4是较低烷基;以及其药学上可接受的盐、其制备方法和包含其的药物组合物。