(1,1-二甲基-丁基)-苯基醚 | 100519-82-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 中文名称: (1,1-二甲基-丁基)-苯基醚
• 英文名称: (1,1-dimethyl-butyl)-phenyl ether
• 英文别名: (1,1-Dimethyl-butyl)-phenyl-aether；2-Methylpentan-2-yloxybenzene
• CAS: 100519-82-2
• 化学式: C₁₂H₁₈O
• 分子量: 178.274
• InChiKey: JFOJOMWGKWXNKF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  13
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  2-phenoxypropene 在 盐酸 、 乙醚 作用下， 生成 (1,1-二甲基-丁基)-苯基醚
  参考文献：
  名称：

  Schostakowskii et al., Zhurnal Obshchei Khimii, 1958, vol. 28, p. 2341; engl. Ausg. S. 2379

  摘要：

  DOI：

文献信息

• QUATERNARY AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20150357204A1

  公开（公告）日：2015-12-10

  A quaternary ammonium salt compound is represented by the following formula (A-1), wherein, R 1 , R 2 , and R 3 each represent an alkyl group, an alkenyl group, an aryl group, or an aralkyl group, a part or all of hydrogen atoms in these groups may be substituted by a hydroxyl group(s), an alkoxy group(s), or a halogen atom(s), and these groups may include one or more of a carbonyl group and an ester bond; R 4 represents a single bond, an alkylene group, an alkenylene group, an arylene group, or an aralkylene group, a part or all of hydrogen atoms in these groups may be substituted by an alkoxy group(s) or a halogen atom(s), and these groups may include one or more of an ether bond, a carbonyl group, an ester bond, and an amide bond; and A − represents a non-nucleophilic counter ion.

  一个四元铵盐化合物由以下式（A-1）表示，其中，R1、R2和R3分别代表烷基、烯基、芳基或芳基烷基，这些基团中的氢原子的一部分或全部可以被羟基、烷氧基或卤原子取代，这些基团中可能包括一个或多个羰基和酯键；R4代表一个单键、烷基、烯基、芳基或芳基烷基，这些基团中的氢原子的一部分或全部可以被烷氧基或卤原子取代，这些基团中可能包括一个或多个醚键、羰基、酯键和酰胺键；A−代表一个非亲核对离子。
• Amino alcohol compound
  申请人：Nishi Takahide

  公开号：US20070191468A1

  公开（公告）日：2007-08-16

  A pharmaceutical composition is provided that has a low toxicity, demonstrates superior physicochemical properties and pharmacokinetics, and has superior peripheral blood lymphocyte count lowering activity. The pharmaceutical composition contains a compound having general formula (I): [Chemical Formula 1] (wherein R 1 represents a methyl group or an ethyl group, R 2 represents a methyl group or an ethyl group, and R 3 represents a phenyl group substituted with 1 to 3 substituents selected from the group consisting of a halogen atom, a lower alkyl group, a cycloalkyl group, a lower alkoxy group, a halogeno lower alkyl group, a lower aliphatic acyl group and a cyano group), a pharmacologically acceptable salt thereof or a pharmacologically acceptable ester thereof.

  提供了一种低毒性、表现出优越的物理化学性质和药代动力学，并具有优越的外周血淋巴细胞计数降低活性的药物组合物。该药物组合物包含具有一般式（I）的化合物：[化学式1]（其中R1代表甲基基团或乙基基团，R2代表甲基基团或乙基基团，R3代表苯基，该苯基被1至3个取自卤原子、较低烷基基团、环烷基团、较低烷氧基团、卤代较低烷基基团、较低脂肪酰基基团和氰基的取代基所取代），以及其药理学上可接受的盐或药理学上可接受的酯。
• AMINO ALCOHOL COMPOUND
  申请人：Sankyo Company, Limited

  公开号：EP1733724A1

  公开（公告）日：2006-12-20

  A pharmaceutical composition is provided that has a low toxicity, demonstrates superior physicochemical properties and pharmacokinetics, and has superior peripheral blood lymphocyte count lowering activity. The pharmaceutical composition contains a compound having general formula (I): (wherein R1 represents a methyl group or an ethyl group, R2 represents a methyl group or an ethyl group, and R3 represents a phenyl group substituted with 1 to 3 substituents selected from the group consisting of a halogen atom, a lower alkyl group, a cycloalkyl group, a lower alkoxy group, a halogeno lower alkyl group, a lower aliphatic acyl group and a cyano group), a pharmacologically acceptable salt thereof or a pharmacologically acceptable ester thereof.

  本研究提供了一种药物组合物，它具有低毒性、优异的理化性质和药代动力学特性，并具有优异的降低外周血淋巴细胞计数的活性。 该药物组合物含有通式（I）的化合物： (其中 R1 代表甲基或乙基，R2 代表甲基或乙基，R3 代表被 1 至 3 个选自卤素原子、低级烷基、环烷基、低级烷氧基、卤代低级烷基、低级脂肪酰基和氰基的取代基取代的苯基）、其药理学上可接受的盐或其药理学上可接受的酯。
• Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2628744A1

  公开（公告）日：2013-08-21

  The present invention provides a silicon-containing surface modifier wherein the modifier contains one or more of a repeating unit shown by the following general formula (A) and a partial structure shown by the following general formula (C).The present invention has an object to provide a resist underlayer film applicable not only to a negatively developed resist pattern formed by a hydrophilic organic compound but also to a conventional positively developed resist pattern formed by a hydrophobic compound.

  本发明提供了一种含硅的表面改性剂，其中改性剂含有一个或多个如下通式（A）所示的重复单元和如下通式（C）所示的部分结构。本发明的目的是提供一种光刻胶底层薄膜，不仅适用于由亲水性有机化合物形成的负显影光刻胶图案，也适用于由疏水性化合物形成的传统正显影光刻胶图案。
• Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2826826A1

  公开（公告）日：2015-01-21

  The present invention provides a composition for forming a coating type BPSG film, which comprises: one or more structures comprising a silicic acid represented by the following general formula (1) as a skeletal structure, one or more structures comprising a phosphoric acid represented by the following general formula (2) as a skeletal structure and one or more structures comprising a boric acid represented by the following general formula (3) as a skeletal structure. There can be provided a composition for forming a coating type BPSG film which is excellent in adhesiveness in fine pattern, can be easily wet etched by a peeling solution which does not cause any damage to the semiconductor apparatus substrate, the coating type organic film or the CVD film mainly comprising carbon which are necessary in the patterning process, and can suppress generation of particles by forming it in the coating process.

  本发明提供了一种用于形成涂层型 BPSG 薄膜的组合物，该组合物包括：由以下通式 (1) 所代表的硅酸作为骨架结构的一种或多种结构、由以下通式 (2) 所代表的磷酸作为骨架结构的一种或多种结构以及由以下通式 (3) 所代表的硼酸作为骨架结构的一种或多种结构。本发明可提供一种用于形成涂层型 BPSG 薄膜的组合物，该组合物在精细图案方面具有优异的粘附性，可通过剥离溶液轻松进行湿蚀刻，不会对半导体设备基板、涂层型有机薄膜或图案化过程中所需的主要由碳构成的 CVD 薄膜造成任何损害，并且通过在涂层过程中形成该组合物，可抑制颗粒的生成。