Synthesis of biaryl ketones by arylation of Weinreb amides with functionalized Grignard reagents under thermodynamic control <i>vs.</i> kinetic control of <i>N</i>,<i>N</i>-Boc<sub>2</sub>-amides
作者:Guangchen Li、Michal Szostak
DOI:10.1039/d0ob00813c
日期:——
A highlyefficient method for chemoselective synthesis of biaryl ketones by arylation of Weinreb amides (N-methoxy-N-methylamides) with functionalized Grignard reagents is reported. This protocol offers rapid entry to functionalized biaryl ketones after Mg/halide exchange with i-PrMgCl·LiCl under operationally-simple and practical reaction conditions. The scope of the method is highlighted in >40 examples
Kinetically Controlled, Highly Chemoselective Acylation of Functionalized Grignard Reagents with Amides by N−C Cleavage
作者:Guangchen Li、Michal Szostak
DOI:10.1002/chem.201904678
日期:2020.1.13
(iPrMgCl⋅LiCl) permits excellent substrate scope with respect to both the amide and Grignard coupling partners. These reactions enable facile, operationally simple and chemoselective access to tetrahedral intermediates from amides under significantly milderconditions than chelation-controlled intermediates. This novel direct two-component coupling sets the stage for using amides as acylating reagents
[EN] NEW CYCLOADDUCT PRECURSORS OF DIHALOBENZOPHENONES AND PREPARATIONS THEREOF<br/>[FR] NOUVEAUX PRÉCURSEURS DE CYCLOADDITION DE DIHALOBENZOPHÉNONES ET LEURS PRÉPARATIONS
申请人:RHODIA OPERATIONS
公开号:WO2019106197A1
公开(公告)日:2019-06-06
The invention relates to new compounds of formula (I): wherein X represents a halogen atom selected from the group consisting of fluorine, chlorine, bromine and iodine, which are useful for the preparation of 4,4'dihalobenzophenones of formula (III): wherein X is as defined above.
Composition for film formation and material for insulating film formation
申请人:JSR CORPORATION
公开号:US20020172652A1
公开(公告)日:2002-11-21
A composition for film formation capable of forming a coating film excellent in low dielectric constant characteristics, cracking resistance, modulus of elasticity, and adhesion to substrates and useful as an interlayer insulating film material in semiconductor devices, etc. The composition for film formation contains (A) at least one member selected from an aromatic polyarylene and an aromatic poly (arylene ether), (B) a polyvinylsiloxane, and (C) an organic solvent.
A class of organic polymers exhibiting enhanced ferromagnetic properties are provided. The ferromagnetic polymeric substances comprise a major structural unit
and have a degree of polymerization of at least 10 and a spin concentration of at least about 1 × 10¹⁷/g. The substances are melt-formable into various articles.