(5E)-3-甲基环十五碳-5-烯-1-酮 | 82001-54-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 中文名称: (5E)-3-甲基环十五碳-5-烯-1-酮
• 英文名称: 4-Sulfanylcyclohexane-1-carboxylic acid
• CAS: 82001-54-5
• 化学式: C₇H₁₂O₂S
• 分子量: 160.24
• InChiKey: KLFCJRIFKLBIEU-UHFFFAOYSA-N

物化性质

• 沸点：
  299.4±33.0 °C(Predicted)
• 密度：
  1.17±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.3
• 重原子数：
  10
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  38.3
• 氢给体数：
  2
• 氢受体数：
  3

文献信息

• CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20190121233A1

  公开（公告）日：2019-04-25

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

  一种化学增感型正型光敏树脂组合物，能够抑制“足部”现象的发生，即底部（靠近支撑表面的一侧）的宽度变窄，小于顶部（靠近抗蚀层表面的一侧）的宽度，同时在使用该光敏树脂组合物在基板的金属表面上形成用作电镀物品模板的抗蚀图案时，能够减少残留物的产生。该光敏树脂组合物中包含一种具有特定结构的巯基化合物，其中包括一个酸发生剂，该酸发生剂在暴露于辐射活性光线或辐射时产生酸，以及一种树脂，在酸的作用下其在碱性溶液中的溶解度增加。
• COMPOUNDS FOR THE INHIBITION OF DGAT1 ACTIVITY
  申请人：Bennett Stuart Norman Lile

  公开号：US20100173958A1

  公开（公告）日：2010-07-08

  Compounds of formula (I), or salts thereof, which inhibit acetyl CoA(acetyl coenzyme A):diacylglycerol acyltransferase (DGAT1) activity are provided, wherein, for example, R 1 is optionally substituted phenyl or naphthyl; Ring A is selected from (3-6C)cycloalkyl, (5-12C)bicycloalkyl and phenyl; n is 0, 1 or 2; R 2 is, for example, hydrogen, fluoro, chloro or hydroxy; Ring B is selected from (3-6C)cycloalkyl, (5-12C)bicycloalkyl and phenyl; L 1 is a direct bond or a defined linker group and R 3 is, for example, hydroxy, carboxy or (1-6C)alkoxycarbonyl; together with processes for their preparation, pharmaceutical compositions containing them and their use as medicaments.

  提供了化学式为（I）的化合物或其盐，其能够抑制乙酰辅酶A：二酰基甘油酰基转移酶（DGAT1）的活性。其中，例如，R1是可选的取代苯基或萘基；环A选自（3-6C）环烷基，（5-12C）双环烷基和苯基；n为0、1或2；R2是，例如，氢、氟、氯或羟基；环B选自（3-6C）环烷基，（5-12C）双环烷基和苯基；L1是直接键或定义的连接基，R3是，例如，羟基，羧基或（1-6C）烷氧羰基；还提供了制备它们的过程，含有它们的药物组合物以及它们作为药物的用途。
• Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US11022880B2

  公开（公告）日：2021-06-01

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

  一种化学放大正型感光树脂组合物，能够抑制非抗蚀部分出现底部（靠近支撑物表面的一面）宽度比顶部（靠近抗蚀层表面的一面）宽度窄的 "起脚 "现象；以及当使用该感光树脂组合物在基底的金属表面上形成作为电镀物品模板的抗蚀图案时产生显影残留物。感光树脂组合物中含有一种具有特定结构的巯基化合物，它包括一种在受到照射的活性射线或辐射时产生酸的酸发生器，以及一种在酸的作用下其碱溶解度增加的树脂。
• US4006068A
  申请人：——

  公开号：US4006068A

  公开（公告）日：1977-02-01
• US4322550A
  申请人：——

  公开号：US4322550A

  公开（公告）日：1982-03-30