申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20200223796A1
公开(公告)日:2020-07-16
A novel onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in exposure latitude, MEF, and LWR.
提供了一种化学增感剂组合物,其中包括式(1)的新型离子盐作为PAG。当使用KrF或ArF准分子激光、EB或EUV进行光刻工艺处理时,该抗蚀组合物具有高灵敏度、减少酸扩散,并在曝光宽度、MEF和LWR方面得到改善。