Provided is a composition for forming a polishing layer of a chemical mechanical polishing pad having polishing characteristics such as a high polishing rate, an excellent planarity of the polished object and less scratches of the polished object.
The above composition for forming a polishing layer of a chemical mechanical polishing pad comprises (A) a polyurethane having a carbon-carbon double bond on a side chain and (B) a cross-linking agent. The polyurethane (A) is preferably a thermoplastic polyurethane (A') obtained by mixing at least the following components (a11) to (a13) and component (a2) in a proportion satisfying the following conditions (1) and (2) and reacting them:
(a11) an oligomer which has one or more hydroxyl groups and one or more carbon-carbon double bonds and which has a number average molecular weight of 500 to 2500, (a12) an oligomer which has two or more hydroxyl groups and either one or both of an ether bond and an ester bond and which has a number average molecular weight of 500 to 2500 and is different from the component (a11), (a13) a monomer having two hydroxyl groups and (a2) a monomer having two isocyanate groups; and (1) a value of M-1/M-OH is 0.85 to 1.10, and (2) a value of M-2/M-OH is 0.45 to 0.80, wherein M-1 is the number of isocyanate groups contained in the component (a2), M-2 is the number of hydroxyl groups contained in the component (a13) and M-OH is the total number of hydroxyl groups contained in the components (a11), (a12) and (a13).
本发明提供了一种用于形成
化学机械抛光垫抛光层的组合物,该组合物具有抛光率高、被抛光物体平面度好、被抛光物体划痕少等抛光特性。
上述用于形成
化学机械抛光垫抛光层的组合物包括 (A) 侧链上具有碳碳双键的聚
氨酯和 (B)
交联剂。聚
氨酯(A)最好是热塑性聚
氨酯(A'),其制备方法是将至少下列组分(a11)至(a13)和组分(a2)按满足下列条件(1)和(2)的比例混合并进行反应:
(a11) 具有一个或多个羟基和一个或多个碳碳双键且平均分子量在 500 至 2500 之间的低聚物,(a12) 具有两个或多个羟基和一个醚键或两个醚键和一个酯键且平均分子量在 500 至 2500 之间且不同于组分(a11)的低聚物,(a13) 具有两个羟基的单体和(a2) 具有两个
异氰酸酯基团的单体;(1) M-1/M-OH 的值为 0.(2) M-2/M-OH 的值为 0.45 至 0.80,其中 M-1 为组分 (a2) 所含
异氰酸酯基团的数目,M-2 为组分 (a13) 所含羟基基团的数目,M-OH 为组分 (a11)、(a12) 和 (a13) 所含羟基基团的总数。