[Problem] To provide a composition for forming a fine pattern having a good pattern shape even after being applied to a thick-film resist, a high size reduction rate and less defects, as well as a method for forming a fine pattern using the same.
[Means for Solution] A composition comprising vinyl resin, an amine compound having a specific cage-type three-dimensional structure and a solvent, and a method for forming a fine pattern using the same.
[问题]提供一种用于形成精细图案的组合物,该组合物在涂覆到厚膜抗蚀剂上后仍具有良好的图案形状、较高的尺寸缩小率和较少的缺陷,以及使用该组合物形成精细图案的方法。
[解决方法] 一种由
乙烯基树脂、具有特定笼型三维结构的胺化合物和溶剂组成的组合物,以及使用该组合物形成精细图案的方法。