申请人:BRAINARD Robert L.
公开号:US20110130538A1
公开(公告)日:2011-06-02
Polymers for photoresists and monomers for incorporation into those polymers are disclosed. The polymers comprise a photoacid generator (PAG) component and at least a second component that is photolytically stable and acid-stable. The polymers may also contain a third, acid-labile component. The photoacid generator is based on N-sulfoxyimides and related moieties that contain photolabile oxygen-heteroatom and oxygen-aromatic carbon bonds.
本发明揭示了用于光刻胶的聚合物和用于纳入这些聚合物的单体。聚合物包括光酸发生器(PAG)组分和至少第二个组分,该组分具有光解稳定性和酸稳定性。聚合物还可以包含第三种酸不稳定的组分。光酸发生器基于N-磺酰氧亚胺和相关的含有光敏氧杂原子和氧芳香碳键的基团。