间氨基苯甲酸钾 | 15054-88-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 间氨基苯甲酸钾
• 英文名称: potassium 3-aminobenzoate
• 英文别名: Potassium;3-aminobenzoate
• CAS: 15054-88-3
• 化学式: C₇H₆NO₂*K
• 分子量: 175.228
• InChiKey: CTTPMOVXSKAAMC-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  -3.36
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  66.2
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  间氨基苯甲酸钾 在 sodium tetrahydroborate 作用下， 以 甲醇 为溶剂， 反应 0.5h， 生成 3-<<<2-hydroxyphenyl>methyl>amino>benzoic acid
  参考文献：
  名称：

  Transition-state analogues as inhibitors for GABA-aminotransferase

  摘要：

  Our previous calculations on the reaction catalysed by GABA-aminotransferase (GABA-T) have been utilized in this work in order to synthesize a series of reversible inhibitors of this enzyme. The synthesized transition-state analogues and their precursors inhibited GABA-T competitively in both the holoenzyme and apoenzyme at 10(-3) and 10(-5) M, respectively. In the case of the holoenzyme, the transition-state analogue series (the conformationally restricted series) gave a significant increase in inhibition values over the open (less conformationally restricted) series.

  DOI：

  10.1016/0223-5234(91)90022-f

文献信息

• Preparation and characterisation of some mixed ligand complexes of chromium nitrilotriacetate with amino acids
  作者：C.L. Sharma、P.K. Jain、T.K. De

  DOI：10.1016/0022-1902(80)80139-4

  日期：1980.1

  The octahedral complexes of the type K[Cr(NTA)(A-A)] and K2[Cr(NTA)(B)2] where NTA = nitrilotriacetate, A-A = deprotonated histidine, proline phenylanthranilic acid, imminodiacetic acid, glutamic acid, aspartic acid, anthranilic acid, threonine, methionine, valine, glycylglycine and glycine and B = deprotonated nicotinic acid, hippuric acid, m and p-aminobenzoic acid, have been prepared and characterised

  类型为K [Cr（NTA）（AA）]和K 2 [Cr（NTA）（B）2 ]的八面体络合物，其中NTA =次氮基三乙酸盐，AA =去质子化的组氨酸，脯氨酸苯基邻氨基苯甲酸，亚氨基二乙酸，谷氨酸，天冬氨酸酸，邻氨基苯甲酸，苏氨酸，蛋氨酸，缬氨酸，甘氨酰甘氨酸和甘氨酸，以及B =去质子化的烟酸，马尿酸，m和对氨基苯甲酸，已基于化学分析，红外光谱，反射率和电子光谱研究进行了制备和表征，磁，电导和极谱测量。配位场的参数，10 DQ，B和β 35被报告，并与来自其它类型的研究中获得的观察结果相关。
• Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate
  申请人：FUJIMI INCORPORATED

  公开号：US10876082B2

  公开（公告）日：2020-12-29

  A surface treatment composition according to the present invention is a surface treatment composition having a pH of lower than 7 and used for treating the surface of a polished object to be polished having a layer containing tungsten, and the surface treatment composition contains a tungsten etching inhibitor and water, wherein the tungsten etching inhibitor is a compound containing a monocyclic or fused polycyclic aromatic hydrocarbon ring having two or more substituents, and the substituents contain at least a nitrogen-containing group and an anionic group.

  根据本发明，一种表面处理组合物是一种 pH 值低于 7 的表面处理组合物，用于处理具有含钨层的待抛光物体的表面，该表面处理组合物含有钨蚀刻抑制剂和水，其中钨蚀刻抑制剂是一种化合物，含有单环或融合多环芳香烃环，该环具有两个或多个取代基，取代基至少含有一个含氮基团和一个阴离子基团。
• Stabiliser for radiopharmaceuticals
  申请人：Storey E. Anthony

  公开号：US20050063902A1

  公开（公告）日：2005-03-24

  The present invention provides an improved stabiliser for radiopharmaceuticals which inhibits impurities from being produced by two kinds of decomposition mechanisms and exhibits such an effect that the shelf life of a radiopharmaceutical after its preparation is prolonged as compared with conventional ones. The improvement comprises a combination of an amino-substituted aromatic carboxylic acid or its salt, ester or amide in combination with a diphosphonic acid or its salt.

  本发明提供了一种改进的放射性药物稳定剂，该稳定剂可抑制两种分解机制产生的杂质，与传统稳定剂相比，可延长放射性药物制备后的保质期。这种改进包括氨基取代的芳香族羧酸或其盐、酯或酰胺与二膦酸或其盐的组合。
• STABILISER FOR RADIOPHARMACEUTICALS
  申请人：GE Healthcare Limited

  公开号：EP1292338B1

  公开（公告）日：2012-09-19
• SURFACE TREATMENT COMPOSITION, METHOD FOR PRODUCING SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE
  申请人：FUJIMI INCORPORATED

  公开号：US20190085270A1

  公开（公告）日：2019-03-21

  A surface treatment composition according to the present invention is a surface treatment composition having a pH of lower than 7 and used for treating the surface of a polished object to be polished having a layer containing tungsten, and the surface treatment composition contains a tungsten etching inhibitor and water, wherein the tungsten etching inhibitor is a compound containing a monocyclic or fused polycyclic aromatic hydrocarbon ring having two or more substituents, and the substituents contain at least a nitrogen-containing group and an anionic group.