An ultraviolet-absorbing polymer material which comprises a copolymer between a (meth)acrylic es. ter monomer and a monomer having at least one fluorine atom as the substituent is disclosed. Also disclosed is a photoetching process which comprises forming a resist membrane on a base, irradiating it with a light beam of a first wavelength through a photomask, optionally conducting development of the resist, and irradiating it with a light beam of a second wavelength in a photodissociable gas atmosphere to conduct etching with reactive radicals generated by the dissociation.
本发明公开了一种紫外线吸收聚合物材料,它由(甲基)
丙烯酸酯单体和至少有一个
氟原子作为取代基的单体之间的共聚物组成。本发明还公开了一种光蚀刻工艺,该工艺包括在基底上形成抗蚀膜,用第一波长的光束通过光掩膜照射抗蚀膜,选择性地对抗蚀膜进行显影,然后在光解离气体环境中用第二波长的光束照射抗蚀膜,用解离产生的活性自由基进行蚀刻。