2,2,3,3-四氟-1,1-二甲基丙基甲基丙烯酸酯 | 64375-26-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 中文名称: 2,2,3,3-四氟-1,1-二甲基丙基甲基丙烯酸酯
• 英文名称: 2,2,3,3-Tetrafluoro-1,1-dimethylpropyl methacrylate
• 英文别名: (3,3,4,4-tetrafluoro-2-methylbutan-2-yl) 2-methylprop-2-enoate
• CAS: 64375-26-4
• 化学式: C₉H₁₂F₄O₂
• 分子量: 228.18
• InChiKey: SXLLWDJFRZODKV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  15
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  6

文献信息

• Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film
  申请人：Daikin Kogyo Co., Ltd.

  公开号：EP0049884A1

  公开（公告）日：1982-04-21

  A process for forming a fluoroalkyl acrylate polymer film on a substrate by plasma polymerization. The fluoroalkyl acrylate polymer film has a high sensitivity to high energy rays and an excellent resolving power, and is very useful as a resist film. The plasma polymerized film of the invention has little pinholes, and is endurable to dry etching. A patterned resist film is prepared by irradiating the film with high energy rays to form a latent pattern and developing the latent pattern by either a wet process using a solvent or an oxygen or oxygen-containing gas plasma etching. Also, a pattern can be formed in the film by only electron beam irradiation. The pattern formation can be attained by electron beam delineation without development treatment. The pattern formation by electron beam delineation is promoted by heat treating the delineated film at a temperature not less than the glass transition temperature of the polymer under reduced pressure or by treating the delineated film with hydrogen or an inert gas plasma.

  一种通过等离子聚合在基底上形成氟烷基丙烯酸酯聚合物薄膜的工艺。这种氟烷基丙烯酸酯聚合物薄膜对高能射线具有高灵敏度和出色的分辨能力，用作抗蚀剂薄膜非常有用。本发明的等离子聚合薄膜几乎没有针孔，而且可以耐受干蚀刻。用高能射线照射薄膜以形成潜伏图案，然后通过使用溶剂的湿法工艺或氧气或含氧气体等离子蚀刻法显影潜伏图案，即可制备出图案抗蚀膜。此外，仅通过电子束照射也可在薄膜上形成图案。电子束划线法无需显影处理即可形成图案。在减压条件下，在不低于聚合物玻璃转化温度的温度下对划线薄膜进行热处理，或用氢气或惰性气体等离子体对划线薄膜进行处理，可促进电子束划线形成图案。
• ULTRAVIOLET-ABSORBING POLYMER MATERIAL AND PHOTOETCHING PROCESS
  申请人：TERUMO KABUSHIKI KAISHA

  公开号：EP0380667A1

  公开（公告）日：1990-08-08

  An ultraviolet-absorbing polymer material which comprises a copolymer between a (meth)acrylic es. ter monomer and a monomer having at least one fluorine atom as the substituent is disclosed. Also disclosed is a photoetching process which comprises forming a resist membrane on a base, irradiating it with a light beam of a first wavelength through a photomask, optionally conducting development of the resist, and irradiating it with a light beam of a second wavelength in a photodissociable gas atmosphere to conduct etching with reactive radicals generated by the dissociation.

  本发明公开了一种紫外线吸收聚合物材料，它由(甲基)丙烯酸酯单体和至少有一个氟原子作为取代基的单体之间的共聚物组成。本发明还公开了一种光蚀刻工艺，该工艺包括在基底上形成抗蚀膜，用第一波长的光束通过光掩膜照射抗蚀膜，选择性地对抗蚀膜进行显影，然后在光解离气体环境中用第二波长的光束照射抗蚀膜，用解离产生的活性自由基进行蚀刻。
• Process for producing oxygen-permeable polymer
  申请人：CIBA-GEIGY AG

  公开号：EP0478261A2

  公开（公告）日：1992-04-01

  A process for producing an oxygen-permeable polymer, which comprises polymerizing (1) at least one first monomer selected from the group consisting of alkenes of 6-10 carbon atoms having one double bond and one side chain methyl group, and (2) at least one second monomer selected from the group consisting of compounds represented by general formula (I) : wherein A represents an unsaturated polymerizable group ; X represents a bivalent hydrocarbon group of 1-10 carbon atoms ; R1, R2, R3, R4, R5 and R6, which may be the same or different, represent fluorine-substituted or unsubstituted alkyl groups, phenyl groups, vinyl groups, hydrogen atoms or Q groups represented by the formula : wherein Y1, Y2 and Y3, which may be the same or different, represent fluorine-substituted or unsubstituted alkyl groups, phenyl groups, vinyl groups, or hydrogen atoms, with the proviso that R1 and R2 are not simultaneously hydrogen atoms, R3 and R4 are not simultaneously hydrogen atoms, R5 and R6 are not simultaneously hydrogen atoms, and at least two of Y1, y2 and Y3 are other than hydrogen ; Z represents a group represented by the formula -X-B (X is as defined above, and B represents an unsaturated polymerizable group or a hydrogen atom) or a fluoroalkyl group ; k is a number of 0-100 ; and when plural groups exist, these groups may be the same or different, and compounds represented by general formula (II) : wherein R7 represents a hydrogen atom, a fluorine atom or a fluorine-substituted or unsubstituted alkyl group; R8 represents a hydrogen atom, an alkyl group of 1-20 carbon atoms, or a fluoroalkyl group of 1-20 carbon atoms bonded to CO through a bivalent hydrocarbon group of 1-4 carbon atoms, with a proviso that when R8 is a hydrogen atom, R7 must be a fluorine-substituted or unsubstituted alkyl group, or polymerizing a monomer represented by general formula (III) : wherein R9 represents a bivalent hydrocarbon group of 1-4 carbon atoms ; R10 represents an alkyl group of 1-20 carbon atoms which may be substituted by at least one member selected from the group consisting of substituents and fluorine atom ; R11 represents an alkyl group of 1-20 carbon atoms which may be substituted by at least one member selected from the group consisting of substituents and fluorine atom, or said monomer and other alkenyl monomers. The polymer produced by the process has very high oxygen permeability, is resistant to adhesion and adsorption of staining substances present in lacrima or intraocular solution, and has excellent machinability and grindability.

  一种生产透氧聚合物的工艺，包括以下步骤 (1) 至少一种第一单体，选自具有一个双键和一个侧链甲基的 6-10 个碳原子 的烯烃组成的组，和 (2) 至少一种第二单体，选自由通式 (I) 所代表的化合物组成的组： 其中 A 代表不饱和可聚合基团；X 代表 1-10 个碳原子的二价烃基；R1、R2、R3、R4、R5 和 R6（可以相同或不同）代表氟取代或未取代的烷基、苯基、乙烯基、氢原子或由式： 其中 Y1、Y2 和 Y3（可以相同或不同）代表氟取代或未取代的烷基、苯基、乙烯基或氢原子，但 R1 和 R2 不同时为氢原子，R3 和 R4 不同时为氢原子，R5 和 R6 不同时为氢原子，且 Y1、y2 和 Y3 中至少有两个不是氢原子；Z 代表由式 -X-B 所表示的基团（X 如上文所定义，B 代表不饱和可聚合基团或氢原子）或氟烷基； k 是 0-100 之间的数字；当存在多个基团时，这些基团可以是相同的基团。 当存在多个基团时，这些基团可以相同或不同： 其中 R7 代表氢原子、氟原子或氟取代或未取代的烷基；R8 代表氢原子、1-20 个碳原子的烷基或通过 1-4 个碳原子的二价烃基与 CO 结合的 1-20 个碳原子的氟烷基，但当 R8 为氢原子时，R7 必须为氟取代或未取代的烷基，或聚合通式 (III) 所代表的单体： 其中 R9 代表 1-4 个碳原子的二价烃基；R10 代表 1-20 个碳原子的烷基，可被至少一个选自取代基和氟原子组成的组的成员取代；R11 代表 1-20 个碳原子的烷基，可被至少一个选自取代基和氟原子组成的组的成员取代，或上述单体和其他烯基单体。通过该工艺生产的聚合物具有极高的透氧性，对存在于泪液或眼内溶液中的染色物质具有抗粘附性和吸附性，并且具有极佳的可加工性和可研磨性。
• JPS06241210A
  申请人：——

  公开号：JPS06241210A

  公开（公告）日：1987-02-23
• JPS60130611A
  申请人：——

  公开号：JPS60130611A

  公开（公告）日：1985-07-12