具有巨大斯托克斯位移的 双光子吸收8-羟基-苯并[ g ]香豆素:用于探测生物分子的对环境不敏感的染料平台†
摘要:
除了光电装置外,具有独特光物理性质的荧光化合物对于开发化学,生物和环境物种的光学探针也是必不可少的。在这种情况下,我们合成了一系列的3-取代的8-羟基苯并[ g ]香豆素衍生物,并表征了它们的光物理和细胞成像特性。作为偶极π扩展的香豆素类似物,它们具有分子内电荷转移特性和良好的双光子成像能力,如两种选定的染料所示。大多数染料在水性介质中发射的波长范围为530–580 nm,并显示出高达197 nm的大斯托克斯位移。尽管具有偶极性质,但3吡啶取代的衍生物5h显着表现出微不足道的溶剂变色性以及对粘度和极性不敏感的发射强度,为探测生物靶标提供了理想的染料平台。作为演示,我们准备了一个基于它的酯酶探针,该探针显示了比例传感行为。
具有巨大斯托克斯位移的 双光子吸收8-羟基-苯并[ g ]香豆素:用于探测生物分子的对环境不敏感的染料平台†
摘要:
除了光电装置外,具有独特光物理性质的荧光化合物对于开发化学,生物和环境物种的光学探针也是必不可少的。在这种情况下,我们合成了一系列的3-取代的8-羟基苯并[ g ]香豆素衍生物,并表征了它们的光物理和细胞成像特性。作为偶极π扩展的香豆素类似物,它们具有分子内电荷转移特性和良好的双光子成像能力,如两种选定的染料所示。大多数染料在水性介质中发射的波长范围为530–580 nm,并显示出高达197 nm的大斯托克斯位移。尽管具有偶极性质,但3吡啶取代的衍生物5h显着表现出微不足道的溶剂变色性以及对粘度和极性不敏感的发射强度,为探测生物靶标提供了理想的染料平台。作为演示,我们准备了一个基于它的酯酶探针,该探针显示了比例传感行为。
Inhibitors of protein kinase for the treatment of disease
申请人:——
公开号:US20030187007A1
公开(公告)日:2003-10-02
The present invention is directed in part towards methods of modulating the function of protein kinases with phenol- and hydroxynaphthalene-based compounds. The methods incorporate cells that express a protein kinase. In addition, the invention describes methods of preventing and treating protein kinase-related abnormal conditions in organisms with a compound identified by the invention. Furthermore, the invention pertains to phenol- and hydroxynaphthalene-based compounds and pharmaceutical compositions comprising these compounds.
A General Strategy Toward pH‐Resistant Phenolic Fluorophores for High‐Fidelity Sensing and Bioimaging Applications
作者:Sourav Sarkar、Anushree Shil、Suman Maity、Yun Lim Jung、Mingchong Dai、Atanu Acharya、Kyo Han Ahn
DOI:10.1002/anie.202311168
日期:2023.10.23
Due to the polar and acidic hydroxyl functionality, phenolic fluorophores provide pH and medium-dependent emission signals, which complicates bioimaging experimental design and reduces the data reliability. We developed a single-step functionalization that makes phenolic fluorophores pH and medium-resistant. The new fluorophores can be used for high-fidelity sensing and bioimaging applications.
Resist underlayer film composition and patterning process using the same
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:EP2476713A1
公开(公告)日:2012-07-18
There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), and one or more kinds of compounds, represented by the following general formulae (2-1) and/or (2-2), and/or equivalent bodies thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.
本发明公开了一种抗蚀剂底层薄膜组合物,其中该组合物含有至少由以下通式(1-1)和/或(1-2)表示的一种或多种化合物和以下通式(2-1)和/或(2-2)表示的一种或多种化合物和/或其等效体缩合而得的聚合物。可以提供一种底层膜组合物,特别是用于三层抗蚀工艺的底层膜组合物,该组合物可以形成反射率降低的底层膜(即作为抗反射膜具有最佳 n 值和 k 值的底层膜)、填充性能优异、图案抗弯曲性能高、蚀刻后尤其是在厚度小于 60 nm 的高纵横向线上不会出现掉线或晃动的底层膜,以及使用该底层膜组合物的图案化工艺。
INHIBITORS OF PROTEIN KINASE FOR THE TREATMENT OF DISEASE