作者:R.Jeffrey Balla、H.H. Nelson、J.R. McDonald
DOI:10.1016/0301-0104(86)80188-4
日期:1986.11
We have used the laser-induced fluorescence technique to study the reactions of the methyl thiyl radical (CH3S) with NO, NO2, and O2 as a function of pressure (1–400 Torr N2 or SF6) and temperature (25–238°C). Rate constants for the reaction with NO are in the transition region between the low- and high-pressure limits and are fit using an expression developed by Troe. The resulting Arrhenius expression
我们已经使用激光诱导荧光技术研究了甲基噻吩基(CH 3 S)与NO,NO 2和O 2随压力(1-400 Torr N 2或SF 6)和温度变化的反应。 (25–238°C)。与NO反应的速率常数位于低压和高压极限之间的过渡区域,并使用Troe开发的表达式进行拟合。将得到的阿累尼乌斯表达是ķ ∞(±2σ)=(1.81±0.84)×10 -12 EXP [(1800±320卡/摩尔)/ RT ]厘米3 /秒。CH 3 S与NO 2反应的速率常数基本上与压力无关,并且产率为k =(8.3±1.4)×10 -11 exp [(160±120 cal / mol)/ RT ] cm 3 / s。与O 2的反应太慢,无法在我们的系统中进行测量。我们估计ķ ⩽2×10 -17厘米3 /秒在室温下。