申请人:Dow Corning Asia, Ltd.
公开号:EP1002823A1
公开(公告)日:2000-05-24
The present invention pertains to a method for manufacturing a hydrogen-silsesquioxane resin in which a solution of HSiCl3 in a halogenated hydrocarbon solvent which can dissolve the organic sulfonic acid described below and which does not react with sulfuric acid is added to a two-phase system comprising [a] an aqueous phase which contains sulfuric acid and an organic sulfonic acid which is not sulfonated by sulfuric acid and which is soluble in both water and the organic phase described below, and [b] an organic phase which contains the halogenated hydrocarbon solvent, and the resulting mixture is agitated. In this method, the ratio of the sulfuric acid relative to the combined weight of the water (including water of hydration in cases where the above sulfonic acid contains such water of hydration) and sulfuric acid is 80 to 96 wt %, and is present in the organic phase at the rate of 0.008 moles/L or greater.
本发明涉及一种氢-硅烷基二氧杂环戊烷树脂的制造方法,在该方法中,将 HSiCl3 在卤代烃溶剂中的溶液(该溶剂可溶解下述有机磺酸且不与硫酸反应)加入到两相体系中,该两相体系包括[a]水相,该水相中含有硫酸和不被硫酸磺化且可溶于水和下述有机相的有机磺酸;以及[b]有机相,该有机相中含有卤代烃溶剂、和 [b] 含有卤代烃溶剂的有机相,并搅拌所得混合物。在此方法中,硫酸相对于水(在上述磺酸含有水合水的情况下,包括水合水)和硫酸的总重量的比率为 80 至 96 wt %,并以 0.008 摩尔/升或更高的比率存在于有机相中。