申请人:Ciba Specialty Chemicals Corporation
公开号:US06004724A1
公开(公告)日:1999-12-21
New oximsulfonate compounds of the formulae I or II, ##STR1## wherein m is 0 or 1; x is 1 or 2; R.sub.1 is, for example phenyl, which is unsubstituted or substituted or R.sub.1 is a heteroaryl radical that is unsubstituted or substituted, or, if m is 0, R.sub.1 additionally is C.sub.2 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or CN; R'.sub.1 is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.2 has for example one of the meanings of R.sub.1 ; n is 1 or 2; R.sub.3 is for example C.sub.1 -C.sub.18 alkyl, R'.sub.3 when x is 1, has one of the meanings given for R.sub.3, or R'.sub.3 in the formula IV and when x is 2 in the formula 1, is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.4 and R.sub.5 are independently of each other for example hydrogen, halogen, C.sub.1 -C.sub.6 alkyl; R.sub.6 is for example hydrogen, phenyl; R.sub.7 and R.sub.8 are independently of each other for example hydrogen or C.sub.1 -C.sub.12 -alkyl; R.sub.9 is for example C.sub.1 -C.sub.12 alkyl; A is S, O, NR.sub.6, or a group of formula A1, A2, A3 or A4 ##STR2## R.sub.10 and R.sub.11 independently of each other have one of the meanings given for R.sub.4 ; R.sub.12, R.sub.13, R.sub.14 and R.sub.15 independently of one another are for example hydrogen, C.sub.1 -C.sub.4 alkyl; Z is CR.sub.11 or N; Z.sub.1 is --CH.sub.2 --, S, O or NR.sub.6, are useful as latent sulfonic acids, especially in photoresist applications.
式I或II的新的氧磺酸盐化合物,其中m为0或1;x为1或2;R.sub.1是例如苯基,未取代或取代,或R.sub.1是未取代或取代的杂环基基团,或者如果m为0,则R.sub.1还是C.sub.2-C.sub.6烷氧羰基,苯氧羰基或CN;R'.sub.1例如是C.sub.2-C.sub.12烷基,苯基;R.sub.2例如具有R.sub.1的一种含义;n为1或2;R.sub.3例如是C.sub.1-C.sub.18烷基,当x为1时,R'.sub.3具有为R.sub.3给出的含义之一,或者当x为2时,在式1中的公式IV中,R'.sub.3例如是C.sub.2-C.sub.12烷基,苯基;R.sub.4和R.sub.5独立地例如是氢,卤素,C.sub.1-C.sub.6烷基;R.sub.6例如是氢,苯基;R.sub.7和R.sub.8独立地例如是氢或C.sub.1-C.sub.12烷基;R.sub.9例如是C.sub.1-C.sub.12烷基;A是S,O,NR.sub.6或者是式A1,A2,A3或A4的基团,其中R.sub.10和R.sub.11独立地具有R.sub.4给出的含义之一;R.sub.12,R.sub.13,R.sub.14和R.sub.15独立地例如是氢,C.sub.1-C.sub.4烷基;Z为CR.sub.11或N;Z.sub.1为--CH.sub.2--,S,O或NR.sub.6。这些化合物作为潜在的磺酸盐,特别是在光刻应用中。