Isobutyric acid 1-ethoxy-ethyl ester | 87025-37-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: Isobutyric acid 1-ethoxy-ethyl ester
• 英文别名: 1-Ethoxyethyl 2-methylpropanoate
• CAS: 87025-37-4
• 化学式: C₈H₁₆O₃
• 分子量: 160.213
• InChiKey: SWVGOUCXVWPIPT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  11
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  乙烯基乙醚 、 异丁酸 在 copper(ll) bromide 作用下， 以 乙醚 为溶剂， 反应 16.0h， 以75%的产率得到Isobutyric acid 1-ethoxy-ethyl ester
  参考文献：
  名称：

  Tordeux, M.; Dorme, R.; Wakselman, C., Synthetic Communications, 1983, vol. 13, # 8, p. 629 - 634

  摘要：

  DOI：

文献信息

• Coloring composition, film, color filter, pattern forming method, method of manufacturing color filter, solid image pickup element, and infrared sensor
  申请人：FUJIFILM Corporation

  公开号：US10578966B2

  公开（公告）日：2020-03-03

  A coloring composition includes colorants and a resin, in which a ratio A/B of a minimum value A of an absorbance in a wavelength range of 400 to 830 nm to a maximum value B of an absorbance in a wavelength range of 1000 to 1300 nm is 4.5 or higher.

  一种着色组合物包括着色剂和树脂，其中波长范围为 400 至 830 纳米的吸光度最小值 A 与波长范围为 1000 至 1300 纳米的吸光度最大值 B 的比率 A/B 为 4.5 或更高。
• TORDEUX, M.;DORME, R.;WAKSELMAN, C., SYNTH. COMMUN., 1983, 13, N 8, 629-633
  作者：TORDEUX, M.、DORME, R.、WAKSELMAN, C.

  DOI：——

  日期：——
• Positive photosensitive resin composition and method of forming cured film from the same
  申请人：Fujifilm Corporation

  公开号：EP2447774B1

  公开（公告）日：2014-02-26
• RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE
  申请人：Watanabe Takeru

  公开号：US20110195362A1

  公开（公告）日：2011-08-11

  There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile group and (B) an organic solvent. There can be a resist underlayer film composition of a multilayer resist film used in lithography for forming a resist underlayer in which generation of wiggling in substrate etching can be highly suppressed and the poisoning problem in forming an upper layer pattern using a chemically amplified resist can be avoided, a process for forming the resist underlayer film, a patterning process and a fullerene derivative.
• COLORING COMPOSITION, FILM, COLOR FILTER, PATTERN FORMING METHOD, METHOD OF MANUFACTURING COLOR FILTER, SOLID IMAGE PICKUP ELEMENT, AND INFRARED SENSOR
  申请人：FUJIFILM Corporation

  公开号：US20170010528A1

  公开（公告）日：2017-01-12

  A coloring composition includes colorants and a resin, in which a ratio A/B of a minimum value A of an absorbance in a wavelength range of 400 to 830 nm to a maximum value B of an absorbance in a wavelength range of 1000 to 1300 nm is 4.5 or higher.