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2-(三氟甲氧基)乙基胺基苯 | 175278-25-8

中文名称
2-(三氟甲氧基)乙基胺基苯
中文别名
N-乙基-2-三氟甲氧基苯胺
英文名称
N-ethyl-2-(trifluoromethoxy)aniline
英文别名
——
2-(三氟甲氧基)乙基胺基苯化学式
CAS
175278-25-8
化学式
C9H10F3NO
mdl
MFCD00204184
分子量
205.18
InChiKey
ZKDGBNRBKFRELS-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    42 °C
  • 密度:
    1.237±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    3.8
  • 重原子数:
    14
  • 可旋转键数:
    3
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.333
  • 拓扑面积:
    21.3
  • 氢给体数:
    1
  • 氢受体数:
    5

安全信息

  • 危险品标志:
    Xi
  • 危险类别码:
    R36/37/38
  • 海关编码:
    2922199090
  • 安全说明:
    S26,S36/37/39

文献信息

  • [EN] OPTICALLY ACTIVE 1-(FLUORO-,TRIFLUOROMETHYL-OR TRIFLUOROMETHOXY-SUBSTITUTED PHENYL)ALKYLAMINE N-MONOALKYL DERIVATIVES AND PROCESS FOR PRODUCING SAME<br/>[FR] DERIVES DE 1-( PHENYLE A SUBSTITUTION FLUORO,TRIFLUOROMETHYLE OU TRIFLUOROMETHOXY)ALKYLAMINE N-MONOALKYLE OPTIQUEMENT ACTIFS ET LEUR PROCEDE DE PRODUCTION
    申请人:CENTRAL GLASS CO LTD
    公开号:WO2004022521A1
    公开(公告)日:2004-03-18
    An optically active 1-(fluoro-, trifluoromethyl- or trifluoromethoxy-substituted phenyl)alkylamine N-monoalkyl derivative represented by the formula [4] is produced by a process including (a) reacting an optically active secondary amine, represented by the formula [1], with an alkylation agent R2-X, in the presence of a base, thereby converting the secondary amine into an optically active tertiary amine represented by the formula [3]; and (b) subjecting the tertiary amine to a hydrogenolysis, thereby producing the N-monoalkyl derivative,wherein R represents a fluorine atom, trifluoromethyl group or trifluoromethoxy group, n represents an integer of from 1 to 5, each of R1 and R2 independently represents an alkyl group having a carbon atom number of from 1 to 6, Me represents a methyl group, Ar represents a phenyl group or 1- or 2-naphthyl group, * represents a chiral carbon, and X represents a leaving group.
    通过以下过程制备一种光学活性的1-(氟代、三氟甲基或三氟甲氧基取代的苯基)烷基胺N-单烷基衍生物,其化学式如下[4]:(a) 用碱存在下,将光学活性的二级胺(化学式[1]表示)与烷基化剂R2-X反应,从而将二级胺转化为光学活性的三级胺(化学式[3]表示);(b) 将三级胺进行氢解作用,从而生成N-单烷基衍生物,其中R代表氟原子、三氟甲基基团或三氟甲氧基团,n代表1至5之间的整数,R1和R2分别代表具有1至6个碳原子的烷基基团,Me代表甲基基团,Ar代表苯基或1-或2-萘基,*代表一个手性碳,X代表一个离去基团。
  • Compositions for the filling of high aspect ratio vertical interconnect access (VIA) holes
    申请人:Heraeus Precious Metals North America Conshohocken LLC
    公开号:US11289238B2
    公开(公告)日:2022-03-29
    A solvent-free electroconductive composition may be used to make electroconductive lines on a surface of a substrate or electroconductive plugs within via holes of a substrate. The solvent-free electroconductive composition is generally made of about 40 to about 95 wt % of a conductive component, about 4 to about 30 wt % of a polymer or oligomer comprising a reactive functional group, up to about 20 wt % of a monomeric diluent comprising a reactive functional group, and up to about 3 wt % of a curing agent. In some instances, the solvent-free electroconductive composition further includes up to about 3 wt % of a lubricating compound. Substrates made using solvent-free electroconductive compositions may be used in printed circuit boards, integrated circuits, solar cells, capacitors, resistors, thermistors, varistors, resonators, transducers, inductors, and multilayer ferrite beads.
    无溶剂导电组合物可用于在基材表面制作导电线或在基材通孔内制作导电塞。无溶剂导电组合物一般由约 40 至约 95 wt % 的导电成分、约 4 至约 30 wt % 含有活性官能团的聚合物或低聚物、最多约 20 wt % 含有活性官能团的单体稀释剂和最多约 3 wt % 的固化剂组成。在某些情况下,无溶剂导电组合物还包括最多约 3 wt % 的润滑化合物。使用无溶剂导电组合物制成的基板可用于印刷电路板、集成电路、太阳能电池、电容器、电阻器、热敏电阻器、压敏电阻器、谐振器、传感器、电感器和多层铁氧体磁珠。
  • OPTICALLY ACTIVE 1-(FLUORO-,TRIFLUOROMETHYL-OR TRIFLUOROMETHOXY-SUBSTITUTED PHENYL)ALKYLAMINE N-MONOALKYL DERIVATIVES AND PROCESS FOR PRODUCING SAME
    申请人:Central Glass Company, Limited
    公开号:EP1530562A1
    公开(公告)日:2005-05-18
  • SIGMA LIGANDS FOR USE IN THE PREVENTION AND/OR TREATMENT OF POST-OPERATIVE PAIN
    申请人:Vela Hernández José Miguel
    公开号:US20120302568A1
    公开(公告)日:2012-11-29
    The invention refers to the use of a sigma ligand, particularly a sigma ligand of formulae (I), (II) or (III) to prevent and/or treat acute and chronic pain developed as a consequence of surgery, especially superficial and/or deep pain secondary to surgical tissue injury, and peripheral neuropathic pain, neuralgia, allodynia, causalgia, hyperalgesia, hyperesthesia, hyperpathia, neuritis or neuropathy secondary to surgical procedure.
  • SIGMA LIGANDS FOR THE PREVENTION AND/OR TREATMENT OF EMESIS INDUCED BY CHEMOTHERAPY OR RADIOTHERAPY
    申请人:Vela Hernández José Miguel
    公开号:US20130109692A1
    公开(公告)日:2013-05-02
    The invention refers to the use of a sigma ligand, preferably a sigma ligand of formula (I), to prevent or treat emesis induced by a chemotherapeutic agent or radioactivity, especially emesis induced by taxanes, vinca alkaloids or platin chemotherapeutic drugs.
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