4-tert-octyl-2,6-bis(hydroxymethyl)phenol | 5568-04-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-tert-octyl-2,6-bis(hydroxymethyl)phenol
• 英文别名: 2-Hydroxy-1.3-bis-hydroxymethyl-5-(1.1.3.3-tetramethyl-butyl)-benzol；2,6-Bis-hydroxymethyl-4-(1,1,3,3-tetramethyl-butyl)-phenol；2,6-Bis(hydroxymethyl)-4-(1,1,3,3-tetramethylbutyl)phenol；2,6-Bis(hydroxymethyl)-4-t-octylphenol；2,6-bis(hydroxymethyl)-4-(2,4,4-trimethylpentan-2-yl)phenol
• CAS: 5568-04-7
• 化学式: C₁₆H₂₆O₃
• 分子量: 266.381
• InChiKey: SCJCWNMQFXNXSG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  19
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  4-tert-octyl-2,6-bis(hydroxymethyl)phenol 230.0 ℃ 、266.64 Pa 条件下， 生成 2-hydroxy-3-methyl-5-(1,1,3,3-tetramethyl-butyl)-benzaldehyde-oxime
  参考文献：
  名称：

  Hultzsch; Schiemann, Chemische Berichte, 1942, vol. 75, p. 363,366

  摘要：

  DOI：
• 作为产物：
  描述：

  异辛烯 在 sodium hydroxide 、 硫酸 作用下， 生成 4-tert-octyl-2,6-bis(hydroxymethyl)phenol
  参考文献：
  名称：

  二叔丁基苯酚的合成-结构-性能-衍生物

  摘要：

  DOI：

  10.1021/ie50347a014

文献信息

• Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US10017664B2

  公开（公告）日：2018-07-10

  Resist underlayer film-forming composition for forming resist underlayer film with high dry etching resistance, wiggling resistance and exerts good flattening property and embedding property for uneven parts, including resin obtained by reacting organic compound A including aromatic ring and aldehyde B having at least two aromatic hydrocarbon ring groups having phenolic hydroxy group and having structure wherein the aromatic hydrocarbon ring groups are bonded through tertiary carbon atom. The aldehyde B may be compound of Formula (1): The obtained resin may have a unit structure of Formula (2): Ar1 and Ar2 each are C6-40 aryl group. The organic compound A including aromatic ring may be aromatic amine or phenolic hydroxy group-containing compound. The composition may contain further solvent, acid and/or acid generator, or crosslinking agent. Forming resist pattern used for semiconductor production, including forming resist underlayer film by applying the resist underlayer film-forming composition onto semiconductor substrate and baking it.

  用于形成具有高干法蚀刻抗性、抗扭曲性并具有良好的平整性和嵌入性能的抗蚀底层膜形成组合物，包括通过使含有芳香环的有机化合物A和至少具有两个含酚羟基的芳香烃环团的醛B反应而获得的树脂，并具有芳香烃环团通过三级碳原子键合的结构。醛B可以是化合物的化学式（1）： 所得的树脂可能具有化学式（2）的单元结构： Ar1和Ar2各自是C6-40芳基团。含有芳香环的有机化合物A可能是芳香胺或含酚羟基的化合物。该组合物可能进一步含有溶剂、酸和/或酸发生剂，或交联剂。用于半导体生产的形成抗蚀图案，包括通过将抗蚀底层膜形成组合物涂覆在半导体衬底上并对其进行烘烤来形成抗蚀底层膜。
• Preferential precipitation of C70 over C60 with p-halohomooxacalix[3]arenes
  作者：Naoki Komatsu

  DOI：10.1039/b208107e

  日期：2003.12.19

  Preferential precipitation of C70 from a toluene solution of C60 and C70 was accomplished with p-trihalohomooxacalix[3]arenes (13·X·X·X) prepared by the reductive coupling of diformylphenols. Heavy halogens, Br and/or I, are essential at the para position of 13·X·X·X for obtaining good yields and selectivities. C70 with up to 92% purity was obtained after the preferential precipitation.

  通过二甲醛苯酚还原偶联制备的对三卤代氧杂喹喔啉并[3]烯（13-X-X-X）可以从 C60 和 C70 的甲苯溶液中优先析出 C70。要获得良好的产率和选择性，13-X-X-X 对位上的重卤素（Br 和/或 I）是必不可少的。经优先沉淀后，可获得纯度高达 92% 的 C70。
• Co-condensation product and rubber composition containing the same
  申请人：Sumitomo Chemical Company, Limited

  公开号：US05717053A1

  公开（公告）日：1998-02-10

  There is provided a co-condensation product obtainable by subjecting a p-alkylphenol to reaction with formaldehyde in the presence of an alkali catalyst to prepare a resol type condensate, and subjecting the resulting resol type condensate to reaction with a m-substituted phenol such as resorcin in the presence of an acid catalyst, wherein the content of the m-substituted phenol is not higher than 4% by weight, and the content of a component having a molecular weight not higher than 1,000 excluding both the p-alkylphenol and the m-substituted phenolis at least 25% by weight based on the total weight of the co-condensation product. This co-condensation product is low in fuming and in hygroscopic properties, exhibits excellent adhesiveness in vulcanizing adhesion between rubber and a reinforcing material, and further provides a vulcanized rubber article of high hardness.

  提供了一种共缩聚产物，其可通过将p-烷基酚在碱性催化剂存在下与甲醛反应以制备树脂型凝聚物，并在酸性催化剂存在下将所得的树脂型凝聚物与m-取代酚（如间苯二酚）反应而获得，其中m-取代酚的含量不高于总共缩聚产物重量的4％，具有分子量不高于1,000的组分的含量（不包括p-烷基酚和m-取代酚）至少为总共缩聚产物重量的25％。这种共缩聚产物低烟、低吸湿性，具有优异的胶粘性，在橡胶和增强材料的硫化粘接中表现出色，进一步提供高硬度的硫化橡胶制品。
• NOVOLAC RESIN-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION USING BISPHENOL ALDEHYDE
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20160068709A1

  公开（公告）日：2016-03-10

  Resist underlayer film-forming composition for forming resist underlayer film with high dry etching resistance, wiggling resistance and exerts good flattening property and embedding property for uneven parts, including resin obtained by reacting organic compound A including aromatic ring and aldehyde B having at least two aromatic hydrocarbon ring groups having phenolic hydroxy group and having structure wherein the aromatic hydrocarbon ring groups are bonded through tertiary carbon atom. The aldehyde B may be compound of Formula (1): The obtained resin may have a unit structure of Formula (2): Ar 1 and Ar 2 each are C 6-40 aryl group. The organic compound A including aromatic ring may be aromatic amine or phenolic hydroxy group-containing compound. The composition may contain further solvent, acid and/or acid generator, or crosslinking agent. Forming resist pattern used for semiconductor production, including forming resist underlayer film by applying the resist underlayer film-forming composition onto semiconductor substrate and baking it.

  高干法蚀刻抗性、抗扭曲性、并对不平整部分表现出良好的平整和嵌入性的抗阻层薄膜形成组合物，包括通过反应含芳香环的有机化合物A和至少有两个芳香族碳环环团且具有酚羟基的醛B所获得的树脂，并具有芳香族碳环环团通过三级碳原子键合的结构。醛B可以是化合物式（1）的化合物：所获得的树脂可以具有式（2）的单元结构：其中Ar1和Ar2各自是C6-40芳基团。含芳香环的有机化合物A可以是芳香胺或含酚羟基的化合物。该组合物还可以含有溶剂、酸和/或酸发生剂，或交联剂。用于半导体生产的形成光刻图形，包括将抗阻层薄膜形成组合物涂覆在半导体基板上并烘烤以形成抗阻层薄膜。
• Color diffusion transfer photographic light-sensitive material
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0385408A2

  公开（公告）日：1990-09-05

  A novel color diffusion transfer photographic light-sensitive material is disclosed, comprising at least a light-sensitive silver halide emulsion layer combined with a dye providing compound capable of releasing or producing a diffusible dye, an image-receiving layer capable of mordanting said diffusible dye and a neutralizing layer, said light-sensitive material further comprising at least one selected from the group consisting of polymers obtained by the condensation of at least one of compounds represented by the general formula (I) and at least one of compounds represented by the general formula (II) in the presence of an acid or alkaline catalyst; polymers obtained by the condensation of at least one of compounds represented by the general formula (I) and at least one of compounds represented by the general formula (III) in the presence of an acid catalyst: novolak resins obtained by the condensation of at least one of compounds represented by the general formula (I) and at least one of compounds represented by the general formula (IV) in the presence of an acid catalyst in a uniform organic solvent system while eliminating off water produced upon azeotropy; and polymers obtained by the condensation of at least one of compounds represented by the general formula (I) and at least one of compounds represented by the general formula (V) in the presence of an acid catalyst: wherein G represents a hydroxyl group or a group which undergoes hydrolysis by an alkali to produce a hydroxyl group; n represents an integer 1 or more, with the proviso that the plurality of G's may be the same or different; RI and R2 may be the same or different and each represents a hydrogen atom of a substituent on benzene ring; R13 and R14 may be the same or different and each represents a hydrogen atom, alkyl group, aryl group, aralkyl group, heterocyclic group, acyl group, carboxyl group or formyl group; R23 represents a hydrogen atom, alkyl group, aryl group, aralkyl group, heterocyclic group, acyl group, carboxyl group or formyl group; R33 represents a hydrogen atom, alkyl group, aryl group, aralkyl group, acyl group, alkenyl group, heterocyclic group, carboxyl group or formyl group; R43 represents a hydrogen atom, alkyl group, aryl group, aralkyl group, heterocyclic group, acyl group or carboxyl group; and R44 and R45 may be the same or different and each represents an alkyl group, with the proviso that R44 and R45 may be connected to each other to form a ring.

  本发明公开了一种新型彩色扩散转印感光材料，它至少包括一个感光卤化银乳剂层，该层与一种能释放或产生可扩散染料的染料提供化合物、一个能将所述可扩散染料媒染的图像接收层和一个中和层结合在一起、所述感光材料还包括至少一种选自以下组别的聚合物： 在酸或碱催化剂存在下，由通式(I)所代表的至少一种化合物和通式(II)所代表的至少一种化合物缩合而得的聚合物；由通式（I）所代表的至少一种化合物和通式（III）所代表的至少一种化合物在酸催化剂存在下缩合而得的聚合物：由通式（I）所代表的至少一种化合物和通式（IV）所代表的至少一种化合物在酸催化剂存在下于均匀有机溶剂体系中缩合而得的酚醛树脂，同时除去共沸时产生的水分；以及由通式（I）所代表的至少一种化合物和通式（V）所代表的至少一种化合物在酸催化剂存在下缩合而得的聚合物： 其中 G 代表羟基或被碱水解产生羟基的基团；n 代表 1 或更多的整数，但多个 G 可以相同或不同；RI 和 R2 可以相同或不同，各自代表苯环上取代基的氢原子；R13 和 R14 可以相同或不同，各自代表氢原子、烷基、芳基、芳烷基、杂环基、酰基、羧基或甲酰基；R23 代表氢原子、烷基、芳基、烷基、杂环基、酰基、羧基或甲酰基； R33 代表氢原子、烷基、芳基、烷基、酰基、烯基、杂环基、羧基或甲酰基；R43 代表氢原子、烷基、芳基、烷基、杂环基、酰基或羧基；以及 R44 和 R45 可以相同或不同，各自代表一个烷基，但 R44 和 R45 可以相互连接形成一个环。