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2-(2,4-dinitrophenyl)ethylsulfonyl chloride | 199122-96-8

中文名称
——
中文别名
——
英文名称
2-(2,4-dinitrophenyl)ethylsulfonyl chloride
英文别名
2-(2,4-Dinitrophenyl)ethanesulfonyl chloride
2-(2,4-dinitrophenyl)ethylsulfonyl chloride化学式
CAS
199122-96-8
化学式
C8H7ClN2O6S
mdl
——
分子量
294.672
InChiKey
QDVLZRIUVGTHFV-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2
  • 重原子数:
    18
  • 可旋转键数:
    3
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.25
  • 拓扑面积:
    134
  • 氢给体数:
    0
  • 氢受体数:
    6

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为反应物:
    描述:
    2'-deoxy-N2-[2-(4-nitrophenyl)ethoxycarbonyl]-O6-[2-(4-nitrophenyl)ethyl]guanosine 、 2-(2,4-dinitrophenyl)ethylsulfonyl chloride 生成 [(2R,3S,5R)-3-hydroxy-5-[6-[2-(4-nitrophenyl)ethoxy]-2-[2-(4-nitrophenyl)ethoxycarbonylamino]purin-9-yl]oxolan-2-yl]methyl 2-(2,4-dinitrophenyl)ethanesulfonate
    参考文献:
    名称:
    New Photolabile Protecting Groups in Nucleoside and Nucleotide Chemistry—Synthesis, Cleavage Mechanisms and Applications
    摘要:
    New photolabile protecting groups have been found in the 2-(2-nitrophenyl)ethoxycarbonyl and the 2-(2-nitrophenyl)ethylsulfonyl group, respectively. The influence of substituents at the phenyl ring as well as the side-chain has been investigated regarding the photolysis rates on irradiation at 365 mn. beta-Branching in the side-chain leads to highly increased rates of photodeprotection. A new type of photocleavage mechanism consisting of a photoinduced beta-elimination process is proposed.
    DOI:
    10.1080/07328319808004738
  • 作为产物:
    描述:
    2,4-二硝基苯乙醇氯化亚砜 、 sodium thiosulfate 作用下, 生成 2-(2,4-dinitrophenyl)ethylsulfonyl chloride
    参考文献:
    名称:
    New Photolabile Protecting Groups in Nucleoside and Nucleotide Chemistry—Synthesis, Cleavage Mechanisms and Applications
    摘要:
    New photolabile protecting groups have been found in the 2-(2-nitrophenyl)ethoxycarbonyl and the 2-(2-nitrophenyl)ethylsulfonyl group, respectively. The influence of substituents at the phenyl ring as well as the side-chain has been investigated regarding the photolysis rates on irradiation at 365 mn. beta-Branching in the side-chain leads to highly increased rates of photodeprotection. A new type of photocleavage mechanism consisting of a photoinduced beta-elimination process is proposed.
    DOI:
    10.1080/07328319808004738
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文献信息

  • Nucleoside derivatives with photolabile protective groups
    申请人:Wolfgang Pfleiderer
    公开号:US06153744A1
    公开(公告)日:2000-11-28
    The invention relates to nucleo-side derivatives with photo-unstable protective groups of the general formula (I) ##STR1## in which R.sup.1 is H, NO.sub.2, CN, OCH.sub.3, halogen, alkyl or alkoxyalkyl with 1 to 4 C atoms, R.sup.2 is H, OCH.sub.3, R.sup.3 is H, F, Cl, Br, NO.sub.2 or an aliphatic acyl radical with 2 to 5 C atoms, R.sup.4 is H, halogen, OCH.sub.3, an alkyl radical with 1 to 4 C atoms or a possibly substituted aryl radical, R.sup.5 is H or a conventional functional group for producing oligonucleotides, R.sup.6 is H, OH, halogen or XR.sup.8, where X is O or S and R.sup.8 is a conventional protective group in nucleotide chemistry, B is adenine, cytosin, guanine, thymine, uracil, 2,6-diaminopurin-9-yl, hypoxanthin-9-yl, 5-methylcytosin-1-yl, 5-amino-4-imidazol carboxylic acid amid-1-yl or 5-amino-4-imidazol carboxylic acid amide-3-yl, where, if B is adenine, cytosin or guanine, the primary amino function may have a permanent protective group. These derivatives may be used for the light-controlled synthesis of oligonucleotides on a DNA chip.
    该发明涉及具有一般式(I)的光不稳定保护基的核苷衍生物,其中R.sup.1为H、NO.sub.2、CN、OCH.sub.3、卤素、1至4个碳原子的烷基或烷氧基烷基,R.sup.2为H、OCH.sub.3,R.sup.3为H、F、Cl、Br、NO.sub.2或具有2至5个碳原子的脂肪酸酰基基团,R.sup.4为H、卤素、OCH.sub.3、具有1至4个碳原子的烷基基团或可能取代的芳基基团,R.sup.5为H或用于产生寡核苷酸的常规功能基团,R.sup.6为H、OH、卤素或XR.sup.8,其中X为O或S,R.sup.8为核苷酸化学中的常规保护基团,B为腺嘌呤、胞嘧啶、鸟嘌呤、胸腺嘧啶、尿嘧啶、2,6-二氨基嘌呤-9-基、次黄嘌呤-9-基、5-甲基胞嘧啶-1-基、5-氨基-4-咪唑甲酸酰胺-1-基或5-氨基-4-咪唑甲酸酰胺-3-基,如果B为腺嘌呤、胞嘧啶或鸟嘌呤,则初级氨基功能可能具有永久保护基。这些衍生物可用于在DNA芯片上进行光控合成寡核苷酸。
  • HETEROCYCLIDENE-N-(ARYL) ACETAMIDE DERIVATIVE
    申请人:UCHIDA Hideharu
    公开号:US20100016285A1
    公开(公告)日:2010-01-21
    The blow-described formula (I) [Ch. 1] a compound represented by formula (I) (wherein k, m, n, and p each represent 0 to 2; j and q represents 0 or 1; R 1 represents a halogen atom, a hydrocarbon group, a heterocyclic group, an alkoxy group, an alkoxycarbonyl group, NH 2 , OH, a carboxyl group, an alkanoyl group, CN, NO 2 , or the like; R 2 represents a halogen atom, an amino group, a hydrocarbon group, an aromatic heterocyclic group, an oxo group, or the like; represents an oxygen atom, —NR 3 —, or —S(O)r- (wherein r is an integer of 0 to 2); X 2 represents a methylene group, an oxygen atom, —NR 3 — (wherein R 3 is a hydrogen atom, a hydrocarbon group, or the like), or S(O)r- (wherein r is an integer of 0 to 2); W represents a methylene group, a carbonyl group, or a sulfonyl group; R 7 represents a hydrogen atom, a hydrocarbon group, a heterocyclic group, or the like; R 8 represents a hydrogen atom, a halogen atom, a hydrocarbon group, a heterocyclic group, the broken line in the ring containing X 1 and X 2 represents a condensation of two rings; cycle moiety represents a five- or six-membered aryl ring or heteroaryl ring; and the solid line and the broken line between L 1 and L 2 are a single bond or double bond, and the wavy line represents an E-isomer or a Z-isomer), a salt thereof, or solvates thereof, and a pharmaceutical composition containing the compound as an active ingredient.
    以下是所描述的公式(I)[Ch. 1]的化合物,由公式(I)表示(其中k、m、n和p各自表示0到2;j和q表示0或1;R1表示卤素原子、碳氢基团、杂环基团、烷氧基、烷氧羰基基团、NH2、OH、羧基、烷酰基、CN、NO2或类似物;R2表示卤素原子、氨基基团、碳氢基团、芳香杂环基团、氧代基团或类似物;表示氧原子、-NR3-或-S(O)r-(其中r为0至2的整数);X2表示亚甲基基团、氧原子、-NR3-(其中R3为氢原子、碳氢基团或类似物)或S(O)r-(其中r为0至2的整数);W表示亚甲基基团、羰基基团或磺酰基基团;R7表示氢原子、碳氢基团、杂环基团或类似物;R8表示氢原子、卤素原子、碳氢基团、杂环基团,环中的X1和X2之间的断线表示两个环的缩合;环基表示五元或六元芳基环或杂芳基环;实线和L1和L2之间的断线是单键或双键,波浪线表示E-异构体或Z-异构体),其盐或溶剂化物,以及含有该化合物作为活性成分的药物组成物。
  • HETEROCYCLIDENE-N-(ARYL)ACETAMIDE DERIVATIVE
    申请人:MOCHIDA PHARMACEUTICAL CO., LTD.
    公开号:EP2128157A1
    公开(公告)日:2009-12-02
    The blow-described formula (I): [Ch. 1] a compound represented by formula (I) : (wherein k, m, n, and p each represent 0 to 2; j and q represents 0 or 1; R1 represents a halogen atom, a hydrocarbon group, a heterocyclic group, an alkoxy group, an alkoxycarbonyl group, NH2, OH, a carboxyl group, an alkanoyl group, CN, NO2, or the like; R2 represents a halogen atom, an amino group, a hydrocarbon group, an aromatic heterocyclic group, an oxo group, or the like; X1 represents an oxygen atom, -NR3-, or -S(O)r- (wherein r is an integer of 0 to 2); X2 represents a methylene group, an oxygen atom, -NR3- (wherein R3 is a hydrogen atom, a hydrocarbon group, or the like), or -S(O)r- (wherein r is an integer of 0 to 2); W represents a methylene group, a carbonyl group, or a sulfonyl group; R7 represents a hydrogen atom, a hydrocarbon group, a heterocyclic group, or the like; R8 represents a hydrogen atom, a halogen atom, a hydrocarbon group, a heterocyclic group, the broken line in the ring containing X1 and X2 represents a condensation of two rings; cycle moiety represents a five- or six-memebered aryl ring or heteroaryl ring; and the solid line and the broken line between L1 and L2 are a single bond or double bond, and the wavy line represents an E-isomer or a Z-isomer), a salt thereof, or solvates thereof, and a pharmaceutical composition containing the compound as an active ingredient.
    吹气式(I): [1] 式 (I) 所代表的化合物: (其中 k、m、n 和 p 分别代表 0 至 2;j 和 q 代表 0 或 1;R1 代表卤素原子、烃基、杂环基、烷氧基、烷氧羰基、NH2、OH、羧基、烷酰基、CN、NO2 或类似物;X1 代表氧原子、-NR3- 或 -S(O)r- (其中 r 为 0 至 2 的整数); X2 代表亚甲基、氧原子、-NR3- (其中 R3 为氢原子、烃基或类似基团)或 -S(O)r- (其中 r 为 0 至 2 的整数);W 代表亚甲基、羰基或磺酰基; R7 代表氢原子、烃基、杂环基或类似基团; R8 代表氢原子、卤素原子、烃基、杂环基;L1和L2之间的实线和断线为单键或双键,波浪线代表E-异构体或Z-异构体)、其盐或其溶物,以及含有该化合物作为活性成分的药物组合物。
  • [DE] NUCLEOSID-DERIVATE MIT PHOTOLABILEN SCHUTZGRUPPEN<br/>[EN] NUCLEOSIDE DERIVATIVES WITH PHOTO-UNSTABLE PROTECTIVE GROUPS<br/>[FR] DERIVES DE NUCLEOSIDES A GROUPES PROTECTEURS PHOTOLABILES
    申请人:PFLEIDERER, Wolfgang
    公开号:WO1997044345A1
    公开(公告)日:1997-11-27
    (DE) Die Erfindung betrifft Nucleosid-Derivate mit photolabilen Schutzgruppen der allgemeinen Formel (I), in der R1 = H, NO2, CN, OCH3, Halogen, Alkyl oder Alkoxyalkyl mit 1 bis 4 C-Atomen, R2 = H, OCH3, R3 = H, F, Cl, Br, NO2 oder ein aliphatischer Acylrest mit 2 bis 5 C-Atomen, R4 = H, Halogen, OCH3, ein Alkylrest mit 1 bis 4 C-Atomen oder ein ggf. substituierter Arylrest, R5 = H oder eine übliche funktionelle Gruppe zur Herstellung von Oligonucleotiden, R6 = H, OH, Halogen oder XR8, wobei X = O oder S und R8 eine in der Nucleotidchemie übliche Schutzgruppe darstellt, B = Adenin, Cytosin, Guanin, Thymin, Uracil, 2,6-Diaminopurin-9-yl, Hypoxanthin-9-yl, 5-Methylcytosin-1-yl, 5-Amino-4-imidazolcarbonsäureamid-1-yl oder 5-Amino-4-imidazolcarbonsäureamid-3-yl, wobei im Falle von B = Adenin, Cytosin oder Guanin die primäre Aminofunktion ggf. eine permanente Schutzgruppe aufweist. Diese Derivate können für die lichtgesteuerte Synthese von Oligonucleotiden auf einem DNA-Chip verwendet werden.(EN) The invention relates to nucleoside derivatives with photo-unstable protective groups of the general formula (I) in which R1 is H, NO2, CN, OCH3, halogen, alkyl or alkoxyalkyl with 1 to 4 C atoms, R2 is H, OCH3, R3 is H, F, Cl, Br, NO2 or an aliphatic acyl radical with 2 to 5 C atoms, R4 is H, halogen, OCH3, an alkyl radical with 1 to 4 C atoms or a possibly substituted aryl radical, R5 is H or a conventional functional group for producing oligonucleotides, R6 is H, OH, halogen or XR8, where X is O or S and R8 is a conventional protective group in nucleotide chemistry, B is adenine, cytosin, guanine, thymine, uracil, 2,6-diaminopurin-9-yl, hypoxanthin-9-yl, 5-methylcytosin-1-yl, 5-amino-4-imidazol carboxylic acid amid-1-yl or 5-amino-4-imidazol carboxylic acid amide-3-yl, where, if B is adenine, cytosin or guanine, the primary amino function may have a permanent protective group. These derivatives may be used for the light-controlled synthesis of oligonucleotides on a DNA chip.(FR) L'invention concerne des dérivés nucléosidiques à groupes protecteurs photolabiles de la formule générale (I) dans laquelle R1 est H, NO2, CN, OCH3, halogène, alkyle ou bien alcoxyalkyle avec 1 à 4 atomes de C, R2 est H, OCH3, R3 est H, F, Cl, Br, NO2 ou un radical acyle aliphatique avec 2 à 5 atomes de C, R4 est H, halogène, OCH3, un radical alkyle avec 1 à 4 atomes de C ou bien un radical aryle éventuellement substitué, R5 est H ou un groupe fonctionnel usuel pour la production d'oligonucléotides, R6 est H, OH, halogène ou bien XR8 où X est O ou S et R8 est un groupe protecteur usuel dans la chimie des nucléotides, B est adénine, cytosine, guanine, thymine, uracile, 2,6-diaminopurin-9-yle, hypoxanthin-9-yle, 5-méthylcytosin-1-yle, amid-1-yle d'acide 5-amino-4-imidazolcarboxylique ou bien amid-3-yle d'acide 5-amino-4-imidazolcarboxylique, et si B est adénine, cytosine ou guanine, la fonction amino primaire peut présenter un groupe protecteur permanent. Ces dérivés peuvent s'utiliser pour la synthèse photorégulée d'oligonucléotides sur une plaquette d'ADN.
    这项发明涉及一类具有光不稳定的保护基团的核苷酸衍生物,其一般化学式为(I)。其中, R1代表H、NO2、CN、OCH3、卤素、烷基或甲氧基丙基,其中每个结构中的碳原子数量分别为1到4个。R2代表H、OCH3。R3代表H、F、Cl、Br、NO2或含2至5个碳原子的直链羰基基团(R3)。R4代表H、卤素、OCH3、烷基(1至4个碳)或可能取代的苯基基团。R5代表H或用于生产寡链核苷酸的常规功能基团。R6代表H、OH、卤素或XR8,此处X为O或S,R8代表常用于核苷酸化学的普通保护基团。 在此的B代表腺嘌呤(A)、鸟嘌呤(C)、胞嘧啶(G)、胸腺嘧啶(T)、尿嘧啶(U)、2,6-二胺嘌呤-9-位(2,6-bis-azido-9-yl)、Hypoxanthin-9-yl、5-甲基胞嘧啶-1-yl、5-氨基-4-甲基嘧啶-4-COOH酰胺-1-yl或5-氨基-4-甲基嘧啶-4-COOH酰胺-3-yl,其中在B为腺嘌呤、鸟嘌呤或胞嘧啶的情况下,主要氨基可能带有永久性保护基团。这些衍生物可以用于光控寡链核苷酸在DNA微芯片上的合成。
  • NUCLEOSID-DERIVATE MIT PHOTOLABILEN SCHUTZGRUPPEN
    申请人:Pfleiderer, Wolfgang
    公开号:EP0901501A1
    公开(公告)日:1999-03-17
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