N-ethyl-N,N-dimethyl-anilinium; bromide | 38283-34-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: N-ethyl-N,N-dimethyl-anilinium; bromide
• 英文别名: N-Aethyl-N,N-dimethyl-anilinium; Bromid；N-Ethyl-N,N-dimethylanilinium bromide；ethyl-dimethyl-phenylazanium;bromide
• CAS: 38283-34-0
• 化学式: Br*C₁₀H₁₆N
• 分子量: 230.148
• InChiKey: XNHOENLPTXQGIL-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  -0.72
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  N-ethyl-N,N-dimethyl-anilinium; bromide 、 三溴化锑 以 甲醇 、 乙醇 为溶剂， 生成 tris(ethyldimethylphenylammonium) nonabromodiatimonate
  参考文献：
  名称：

  乙基二甲基苯基铵-卤代锑酸盐(III)

  摘要：

  Die Titelverbindungen wurden durch Reaktion von SbX3 mit EtMe2PhNX (X = Cl, Br, I) in Ethanol erhalten。Strukturbestimmungen an Einkristallen bei Zimmertemperatur ergaben: [EtMe2PhN]4Sb4Cl161, RG P21/n, Nr. 14, a = 1234,1(2), b = 1299,8(2), c = 1985,9(5) pm, β = 96,81(2)° 和 Z = 2.；[EtMe2PhN]3[Sb2Br9], 2, RG Pnma, Nr。62, mit a = 3562,0(7), b = 995,4(2), c = 1276,1(3) pm 和 Z = 4；[EtMe2PhN]4[Sb6I22] 3

  DOI：

  10.1002/(sici)1521-3749(199904)625:4<667::aid-zaac667>3.0.co;2-b
• 作为产物：
  描述：

  溴乙烷 、 N,N-二甲基苯胺 生成 N-ethyl-N,N-dimethyl-anilinium; bromide
  参考文献：
  名称：

  New Compounds. Dimethylethylphenylammonium Bromide

  摘要：

  DOI：

  10.1021/ja01864a067

文献信息

• Process for preparing (S)- alpha-cyano-3-phenoxybenzyl-(S)-2-(4-chlorophenyl)-isovalerate
  申请人：Reddy Venkata Narayana Vaddu

  公开号：US20060128982A1

  公开（公告）日：2006-06-15

  The present invention relates to an environmentally benign process for the preparation of (S)-α-cyano-3-phenoxybenzyl-(S)-2-(4-chlorophenyl)isovalerate from its diastereomeric mixture (RS)-α-cyano-3-phenoxybenzyl-(S)-2-(4-chlorophenyl) isovalerate.

  本发明涉及一种环保的工艺，用于从其对映体混合物(RS)-α-氰基-3-苯氧基苯甲酰-(S)-2-(4-氯苯基)异戊酸酯中制备(S)-α-氰基-3-苯氧基苯甲酰-(S)-2-(4-氯苯基)异戊酸酯。
• NOVEL ETCHING COMPOSITION
  申请人：FujiFilm Electronic Materials USA, Inc.

  公开号：EP2683792B1

  公开（公告）日：2019-09-25
• Novel Etching Composition
  申请人：Takahashi Tomonori

  公开号：US20120231632A1

  公开（公告）日：2012-09-13

  This disclosure relates to an etching composition containing at least one sulfonic acid, at least one compound containing a halide anion, the halide being chloride or bromide, at least one compound containing a nitrate or nitrosyl ion, and water. The at least one sulfonic acid can be from about 25% by weight to about 95% by weight of the composition. The halide anion can be chloride or bromide, and can be from about 0.01% by weight to about 0.5% by weight of the composition. The nitrate or nitrosyl ion can be from about 0.1% by weight to about 20% by weight of the composition. The water can be at least about 3% by weight of the composition.
• MONITORING METHOD AND SYSTEM OF METAL IONS OR OXYGEN IONS APPLICABLE TO HIGH CONCENTRATION NON-AQUEOUS ELECTROLYTE
  申请人：Korea Atomic Energy Research Institute

  公开号：US20130264222A1

  公开（公告）日：2013-10-10

  A monitoring method of metal ions or oxygen ions applicable to a high concentration non-aqueous electrolyte includes: applying a potential in a non-aqueous electrolyte to obtain current information with respect to the potential; varying the potential applied in the non-aqueous electrolyte containing metal ion concentration or oxygen ion concentration such that the metal ion concentration or the oxygen ion concentration is maintained in spite of the potential being applied; detecting a linear relationship among the concentration, the current, and passed charges in the non-aqueous electrolyte by repeatedly performing the obtaining step and the varying step, while changing the concentration; and calculating metal ion concentration or oxygen ion concentration of the non-aqueous electrolyte in pyroprocessing of the non-aqueous electrolyte by using the linear relationship. Concentration and components of a solute existing in a non-aqueous electrolyte can be measured while an electrowinning process and pyroprocessing is being conducted.
• US7560585B2
  申请人：——

  公开号：US7560585B2

  公开（公告）日：2009-07-14