申请人:Korea Kumbo Petrochemical Co., Ltd.
公开号:US06111143A1
公开(公告)日:2000-08-29
This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compounds, especially as an useful photoacid generator of the chemically amplified photoresist employed in semiconductor materials. Since the sulfonium salt of this invention, so prepared via one-step reaction between sulfoxide compound and aromatic compound in the presence of perfluoroalkanesulfonic anhydride, has the advantages in that by overcoming some shortcomings of the prior art to prepare the sulfonium salt via two steps using Grinard reagent, this invention may provide a novel sulfonium salt with higher yield which cannot be achieved in the prior art and also to prepare even any conventional sulfonium salt having better yield.
这项发明涉及一种亚砜盐,包括其制备方法,该亚砜盐在聚合过程中有效地用作光酸引发剂或自由基光引发剂,以及光酸发生剂,保护有机化合物的保护基,特别是作为半导体材料中所使用的化学增感光阻的有用光酸发生剂。由于这项发明的亚砜盐是通过在全氟烷磺酸酐存在下,亚砜化合物和芳香化合物之间的一步反应制备而成的,具有以下优点:通过克服以往使用Grinard试剂进行两步制备亚砜盐的一些缺点,这项发明可以提供一种新颖的亚砜盐,其产率更高,这是以往无法实现的,并且可以制备任何传统的亚砜盐,产率更高。