Positive resist composition and method of forming a resist pattern using the same
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:EP2093213B1
公开(公告)日:2017-10-04
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
申请人:Seshimo Takehiro
公开号:US20100121077A1
公开(公告)日:2010-05-13
A compound represented by general formula (I); and a compound represented by general formula (b1-1).
wherein Q
1
represents a divalent linkage group or a single bond; Y
1
represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO
2
— bond in the structure thereof; M
−
represents an alkali metal ion; and A
+
represents an organic cation.