申请人:Fordonal, S.A.
公开号:US04550116A1
公开(公告)日:1985-10-29
Compounds of the general formula I: ##STR1## wherein R.sup.1 represents a thienyl group, or a phenyl group optionally substituted by a halogen (preferably fluorine or chlorine) atom, a lower alkoxy or lower alkyl group, R.sup.2 represents a hydrogen or halogen (preferably fluorine) atom, a lower alkoxy or lower alkyl group, R.sup.3 represents a hydrogen or halogen (preferably fluorine) atom, a lower alkylthio, lower alkoxy or lower alkyl group, or a cycloalkyl group containing 5 or 6 carbon atoms, or a group of the general formula: ##STR2## wherein R.sup.4 and R.sup.5 singly each represents a hydrogen atom or lower alkyl group, R.sup.6 represents a cycloalkyl, hydroxymethyl, carboxy or lower alkoxycarbonyl group, and W represents a carbonyl ##STR3## or a hydroxymethylene [viz. --CH(OH)--] group, and pharmacologically acceptable salts thereof possess potent selective Histamine H.sub.1 -receptor blocking and calcium antagonist properties and are of interest in the treatment of a variety of respiratory, allergenic and cardiovascular disease states. The new compounds can be prepared by various methods based on the condensation of .alpha.-substituted benzyl halides with N-(benzoylpropyl or phenyl-hydroxypropyl)-4-hydroxy piperidines or condensation of di-substituted-methoxy-piperidines with a benzoylpropyl halide or a phenyl-hydroxypropyl-halide followed, where necessary, by removal of protecting groups.
通式I的化合物:##STR1##其中R.sup.1代表噻吩基团,或者是一个苯基团,可以选择地被卤素(优选氟或氯)原子、较低的烷氧基或较低的烷基团取代,R.sup.2代表氢或卤素(优选氟)原子、较低的烷氧基或较低的烷基团,R.sup.3代表氢或卤素(优选氟)原子、较低的烷硫基、较低的烷氧基或较低的烷基团,或者含有5或6个碳原子的环烷基团,或者是通式的一个基团:##STR2##其中R.sup.4和R.sup.5分别代表氢原子或较低的烷基团,R.sup.6代表环烷基、羟甲基、羧基或较低的烷氧羰基团,W代表一个羰基##STR3##或一个羟甲亚基[即--CH(OH)--]团,以及其药理学上可接受的盐具有强效的选择性组胺H.sub.1-受体阻滞和钙拮抗作用,并且在治疗各种呼吸道、过敏和心血管疾病状态方面具有重要意义。这些新化合物可以通过基于α-取代苄卤化物与N-(苯甲酰基丙基或苯基-羟基丙基)-4-羟基哌啶的缩合反应或二取代甲氧基哌啶与苯甲酰基卤化物或苯基-羟基丙基卤化物的缩合反应制备,随后必要时去除保护基。