An Electroreductive Approach to Radical Silylation via the Activation of Strong Si–Cl Bond
作者:Lingxiang Lu、Juno C. Siu、Yihuan Lai、Song Lin
DOI:10.1021/jacs.0c10899
日期:2020.12.23
In this context, reactions mediated by silyl radicals have become increasingly attractive but methods for accessing these intermediates remain limited. We present a new strategy for silyl radical generation via electroreduction of readily available chlorosilanes. At highly biased potentials, electrochemistry grants access to silyl radicals through energetically uphill reductive cleavage of strong
C(sp3)-Si 键的构建在合成、医药和材料化学中很重要。在这种情况下,由甲硅烷基介导的反应变得越来越有吸引力,但获得这些中间体的方法仍然有限。我们提出了一种通过电还原容易获得的氯硅烷来生成甲硅烷基自由基的新策略。在高度偏置的电位下,电化学通过强 Si-Cl 键的能量上坡还原裂解获得甲硅烷基自由基。事实证明,该策略在简单且无过渡金属条件下的各种烯烃甲硅烷化反应中是通用的,包括二甲硅烷基化、氢化甲硅烷基化和烯丙基甲硅烷基化。