Onium salts of substituted phenylmethylbenzene-sulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect after coating, development and peeling, and improved pattern profile after development.
取代苯甲基
苯磺酸根离子的离子盐与
碘离子或
硫离子的离子盐是一种新颖的化合物。含有该离子盐作为光酸发生剂的
化学增感抗蚀剂组成物适用于微纳加工,特别是深紫外光刻,因为具有许多优点,包括提高分辨率,最小化线宽变化或形状退化,即使长期PED,涂层,开发和剥离后也能最小化缺陷,并且在开发后改善图案轮廓。