3-formyl-4-methylbenzenesulfonyl fluoride | 139689-29-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 3-formyl-4-methylbenzenesulfonyl fluoride
• CAS: 139689-29-5
• 化学式: C₈H₇FO₃S
• 分子量: 202.206
• InChiKey: POEZOBQWCDNCQV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.5
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.12
• 拓扑面积：
  59.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  一氧化碳 、 甲苯 在 五氟化锑 、 氟磺酸 作用下， 反应 168.0h， 以2%的产率得到对甲基苯甲醛
  参考文献：
  名称：

  Formylation of aromatic compounds with carbon monoxide in HSO3F-SbF5 uner atmospheric pressure

  摘要：

  The formylation of aromatic compounds such as benzene, toluene, xylenes, mesitylene, indan, tetralin, fluorobenzene, chlorobenzene, and bromobenzene was carried out in HSO3F-SbF5 under atmospheric CO pressure at 0-degrees-C. In HSO3F-SbF5, both formylation and sulfonation took place to give formyl and sulfonyl compounds. In the case of alkylbenzenes, including toluene, xylenes, mesitylene, and tetralin, formylalkylbenzenesulfonyl fluorides, new compounds, were obtained by a one-pot reaction as well as alkylbenzaldehydes, alkylbenzenesulfonyl fluorides, and bis(alkylphenyl) sulfones. The direct introduction of a formyl and sulfonyl group was achieved in alkylbenzenes. The reaction path of the new compounds is a two-step reaction comprised of formylation as the first step and sulfonation as the second step. The product composition was strongly dependent on the acid strength of the HSO3F-SbF5 systems. The formyl compounds became predominant with increasing acidity of the HSO3F-SbF5 system. On the other hand, only sulfonyl compounds were produced when the acidity of the HSO3F-SbF5 system was low.

  DOI：

  10.1021/jo00035a024

文献信息

• US5030752A
  申请人：——

  公开号：US5030752A

  公开（公告）日：1991-07-09
• US5095150A
  申请人：——

  公开号：US5095150A

  公开（公告）日：1992-03-10
• Formylation of aromatic compounds with carbon monoxide in HSO3F-SbF5 uner atmospheric pressure
  作者：Mutsuo Tanaka、Jun Iyoda、Yoshie Souma

  DOI：10.1021/jo00035a024

  日期：1992.4

  The formylation of aromatic compounds such as benzene, toluene, xylenes, mesitylene, indan, tetralin, fluorobenzene, chlorobenzene, and bromobenzene was carried out in HSO3F-SbF5 under atmospheric CO pressure at 0-degrees-C. In HSO3F-SbF5, both formylation and sulfonation took place to give formyl and sulfonyl compounds. In the case of alkylbenzenes, including toluene, xylenes, mesitylene, and tetralin, formylalkylbenzenesulfonyl fluorides, new compounds, were obtained by a one-pot reaction as well as alkylbenzaldehydes, alkylbenzenesulfonyl fluorides, and bis(alkylphenyl) sulfones. The direct introduction of a formyl and sulfonyl group was achieved in alkylbenzenes. The reaction path of the new compounds is a two-step reaction comprised of formylation as the first step and sulfonation as the second step. The product composition was strongly dependent on the acid strength of the HSO3F-SbF5 systems. The formyl compounds became predominant with increasing acidity of the HSO3F-SbF5 system. On the other hand, only sulfonyl compounds were produced when the acidity of the HSO3F-SbF5 system was low.