methacrylate de trichloro-2,2,2 ethyle | 50601-47-3

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: methacrylate de trichloro-2,2,2 ethyle
• 英文别名: 2,2,2-trichloroethyl methacrylate；methacrylic acid-(2,2,2-trichloro-ethyl ester)；Methacrylsaeure-(2,2,2-trichlor-aethylester)；2,2,2-Trichlorethyl-methacrylat；2,2,2-trichloroethyl 2-methylprop-2-enoate
• CAS: 50601-47-3
• 化学式: C₆H₇Cl₃O₂
• 分子量: 217.479
• InChiKey: IUGNCEABJSRDPG-UHFFFAOYSA-N

物化性质

• 沸点：
  55 °C(Press: 1.0 Torr)
• 密度：
  1.3264 g/cm3
• 保留指数：
  1138

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  11
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

安全信息

• 海关编码：
  2916140000

反应信息

• 作为产物：
  描述：

  2,2,2-三氯乙醇 、 甲基丙烯酸酐 在 硫酸 作用下， 生成 methacrylate de trichloro-2,2,2 ethyle
  参考文献：
  名称：

  Acrylic Esters of Some Substituted Alkanols

  摘要：

  DOI：

  10.1021/ja01167a116

文献信息

• Functionalized Photoreactive Compounds
  申请人：Cherkaoui Mohammed Zoubair

  公开号：US20080274304A1

  公开（公告）日：2008-11-06

  The present invention concerns functionalized photoreactive compounds of formula (I), that are particularly useful in materials for the alignment of liquid crystals. Due to the adjunction of an electron withdrawing group to specific molecular systems bearing an unsaturation directly attached to two unsaturated ring systems, exceptionally high photosensitivities, excellent alignment properties as well as good mechanical robustness could be achieved in materials comprising said functionalized photoreactive compounds of the invention.

  本发明涉及式(I)的官能化光反应化合物，特别适用于液晶对准材料。由于在特定分子系统中的不饱和键直接连接到两个不饱和环系统上附加了一个电子受体基团，因此在包含本发明的这些官能化光反应化合物的材料中可以实现异常高的光敏性、优异的对准性能以及良好的机械稳健性。
• [EN] CYANOSTILBENES<br/>[FR] CYANOSTILBÈNES
  申请人：ROLIC AG

  公开号：WO2014191292A1

  公开（公告）日：2014-12-04

  The present invention relates to novel compounds that are particularly useful for the alignment, especially photoalignment, of slave material, especially liquid crystals for optical or electro-optical applications, such as security applications, liquid crystal devices or optical or electro-optical films.

  本发明涉及一种新型化合物，特别适用于用于光学或电光应用的从材料，尤其是液晶的定向，特别是光定向，如安全应用、液晶器件或光学或电光薄膜。
• Photoactivation of fluorescence of rhodamine dyes in the presence of haloalkanes
  作者：I. V. Ivanov、S. M. Dolotov、O. I. Kobeleva、T. M. Valova、V. A. Barachevsky、V. F. Traven

  DOI：10.1007/s11172-013-0163-5

  日期：2013.5

  Organic halogen derivatives, viz., hexachloroethane, 2,2,2-trichloroethanol, 2,2,2-tribromoethanol, butyl trichloroacetate, 2,2,2-trichloroethyl methacrylate, can efficiently activate fluorescence of lactone forms of rhodamine dyes by UV irradiation through the UFS-1 light filter in both solutions and polymer poly(methyl methacrylate) films. This ability is also typical of the copolymer of methyl methacrylate and 2,2,2-trichloroethyl methacrylate, which is promising for the development of detecting media for archive optical data storage with fluorescent readout.

  有机卤素衍生物，即六氯乙烷、2,2,2-三氯乙醇、2,2,2-三溴乙醇、三氯乙酸丁酯、2,2,2-三氯乙基甲基丙烯酸酯，在溶液和聚合物聚甲基丙烯酸甲酯薄膜中通过 UFS-1 滤光片进行紫外线照射，可有效激活罗丹明染料内酯形式的荧光。这种能力也是甲基丙烯酸甲酯和 2,2,2- 三氯乙基甲基丙烯酸酯共聚物的典型特征，有望用于开发具有荧光读取功能的档案光学数据存储检测介质。
• RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP
  申请人：Shibayama Wataru

  公开号：US20110143149A1

  公开（公告）日：2011-06-16

  There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hard mask or a bottom anti-reflective coating, or a resist underlayer film causing no intermixing with a resist and having a dry etching rate higher than that of the resist. A film forming composition comprising a silane compound having an onium group, wherein the silane compound having an onium group is a hydrolyzable organosilane having, in a molecule thereof, an onium group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The composition uses as a resist underlayer film forming composition for lithography. A composition comprising a silane compound having an onium group, and a silane compound having no onium group, wherein the silane compound having an onium group exists in the whole silane compound at a ratio of less than 1% by mol, for example 0.01 to 0.95% by mol. The hydrolyzable organosilane may be a compound of Formula: R 1 a R 2 b Si(R 3 ) 4-(a+b) . A resist underlayer film obtained by applying the composition as claimed in any one of claims 1 to 14 onto a semiconductor substrate and by baking the composition.

  提供一种用于光刻的抗蚀底层膜形成组合物，用于形成可用作硬掩膜或底部防反射涂层的抗蚀底层膜，或者是不与抗蚀剂混合且具有比抗蚀剂更高的干法刻蚀速率的抗蚀底层膜。该组合物包括具有离子基的硅烷化合物，其中具有离子基的硅烷化合物是一种可水解的有机硅烷，其分子中具有一个离子基、其水解产物或水解缩合产物。该组合物用作光刻的抗蚀底层膜形成组合物。组合物包括具有离子基的硅烷化合物和不具有离子基的硅烷化合物，其中具有离子基的硅烷化合物在整个硅烷化合物中的摩尔比例小于1％，例如为0.01到0.95％。可水解的有机硅烷可以是式的化合物：R1aR2bSi（R3）4-（a+b）。通过将所述组合物按照权利要求1至14中的任一项涂布到半导体基片上并烘烤所得到的抗蚀底层膜。
• Method for manufacturing porous structure and method for forming pattern
  申请人：KABUSHIKI KAISHA TOSHIBA

  公开号：US20030222048A1

  公开（公告）日：2003-12-04

  A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.

  一种形成图案的材料包含嵌段共聚物或接枝共聚物，并形成具有微观聚合物相的结构，在其中，关于构成嵌段共聚物或接枝共聚物的聚合物链中的至少两个聚合物链，构成各自聚合物链的单体单位的N/(Nc-No)值之比为1.4或更高，其中N表示单体单位中的总原子数，Nc表示单体单位中的碳原子数，No表示单体单位中的氧原子数。