[EN] MOLYBDENUM ALLYL COMPLEXES AND USE THEREOF IN THIN FILM DEPOSITION<br/>[FR] COMPLEXES DE MOLYBDÈNE D'ALLYLE ET LEUR UTILISATION EN DÉPÔT DE FILM MINCE
申请人:SIGMA ALDRICH CO LLC
公开号:WO2013112383A1
公开(公告)日:2013-08-01
Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I) and Formula (II), wherein R1, R3, R5, R7, R8 and R10 are independently and at each occurrence alkyl; R2, R6 and R9 are independently alkyl; R4 and R11 are independently and at each occurrence selected from the group consisting of alkyl, alkenyl, and alkynyl; x, z, a, c, d and f are independently zero, 1, or 2; y, b and e are independently zero or 1; and n and m are independently zero to 5.
本文提供了钼配合物及其在薄膜沉积中的应用,如CVD和ALD。钼配合物在结构上对应于式(I)和式(II),其中R1、R3、R5、R7、R8和R10在每次出现时独立地为烷基;R2、R6和R9独立地为烷基;R4和R11在每次出现时独立地选择自烷基、烯烃和炔烃的基团中的一种;x、z、a、c、d和f独立地为零、1或2;y、b和e独立地为零或1;n和m独立地为零至5。