2,4,6-tricyclohexylbenzenesulfonic acid | 792159-83-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,4,6-tricyclohexylbenzenesulfonic acid
• 英文别名: 2,4,6-tricyclohexylphenylsulfonic acid
• CAS: 792159-83-2
• 化学式: C₂₄H₃₆O₃S
• 分子量: 404.614
• InChiKey: UCRKSDURTNVEQD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.3
• 重原子数：
  28
• 可旋转键数：
  4
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  2,4,6-tricyclohexylbenzenesulfonyl chloride 在 potassium hydroxide 作用下， 以 乙醇 、 水 为溶剂， 以67%的产率得到2,4,6-tricyclohexylbenzenesulfonic acid
  参考文献：
  名称：

  将立体选择性构建到用于交替共聚的化学选择性开环复分解聚合催化剂中

  摘要：

  这样的方式：具有不对称双齿膦配体的钌配合物带有两个大小不同的取代基（绿色球体），通过开环复分解聚合（ROMP）生成降冰片烯和环辛烯的完全交替的共聚物。的E / Z 比率可以系统通过改变芳基磺酸盐配位体（蓝色矩形）的体积的影响。

  DOI：

  10.1002/anie.200906846

文献信息

• ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200223796A1

  公开（公告）日：2020-07-16

  A novel onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in exposure latitude, MEF, and LWR.

  提供了一种化学增感剂组合物，其中包括式（1）的新型离子盐作为PAG。当使用KrF或ArF准分子激光、EB或EUV进行光刻工艺处理时，该抗蚀组合物具有高灵敏度、减少酸扩散，并在曝光宽度、MEF和LWR方面得到改善。
• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AU RAYONNEMENT ET PROCÉDÉ DE FORMATION DE MOTIFS AU MOYEN DE LA COMPOSITION
  申请人：FUJIFILM CORP

  公开号：WO2010035905A1

  公开（公告）日：2010-04-01

  An actinic ray-sensitive or radiation-sensitive resin composition comprising any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, -O-, -S-, -C(=O)-, -S(=O)-, -S(=O)?2- and OS(=O)2-, provided that -C(=O)O- is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.

  一种光化学射线敏感性或辐射敏感性树脂组合物，包括下面的通式(I)中的任何一种化合物；其中：Ar代表可能具有除了-(A-B)基团之外的取代基的芳香环；n为大于等于1的整数；A代表从单键、烷基基团、-O-、-S-、-C(=O)-、-S(=O)-、-S(=O)2-和OS(=O)2-中选取的任意一个或两个以上成员的组合，但不包括-C(=O)O-；B代表含有4个或更多碳原子的烃基团的基团，当n大于等于2时，两个或更多个-(A-B)基团可以相同或不同；M+代表有机离子。
• ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200369605A1

  公开（公告）日：2020-11-26

  An onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by lithography, the resist composition exhibits a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

  提供一种化学式为（1）的铵盐和包括该铵盐作为PAG的化学增感抗蚀组合物。通过光刻加工时，该抗蚀组合物表现出高灵敏度，最小LWR和改善的CDU，无论其为正像还是负像。
• ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20210179554A1

  公开（公告）日：2021-06-17

  An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.

  提供一种具有化学式（1）的醇铵盐，用作酸扩散抑制剂，以及包括该酸扩散抑制剂的化学增强型抗蚀剂组合物。当通过光刻加工时，该抗蚀剂组合物表现出高灵敏度和优异的光刻性能因素，例如CDU和LWR。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160280621A1

  公开（公告）日：2016-09-29

  The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R 1 and R 6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R 2 and R 5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R 3 and R 4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R 3 and R 4 may be bonded to each other to form a ring.

  该组合物包含一种碱溶性树脂和一种由下列通式（I）表示的交联剂。在该式中，R1和R6各自独立地表示氢原子或具有5个或更少碳原子的碳氢基团；R2和R5各自独立地表示烷基、环烷基、芳基或酰基；R3和R4各自独立地表示氢原子或具有2个或更多碳原子的有机基团，且R3和R4可以结合形成环。