Polymers Useful in Photoresist Compositions and Compositions Thereof
申请人:Padmanaban Munirathna
公开号:US20080171270A1
公开(公告)日:2008-07-17
The present application relates to a polymer having the formula
where R
30
, R
31
, R
32
, R
33
, R
40
, R
41
, R
42
, jj, kk, mm, and nn are described herein. The compounds are useful in forming photoresist compositions.
US8735609B2
申请人:——
公开号:US8735609B2
公开(公告)日:2014-05-27
Weizmann; Sulzbacher; Bergmann, Journal of the American Chemical Society, 1948, vol. 70, p. 1157