6-ethyl-5-methyl-2-thioxo-2,3-dihydro-1H-pyrimidin-4-one | 54089-08-6

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二嗪类
• 英文名称: 6-ethyl-5-methyl-2-thioxo-2,3-dihydro-1H-pyrimidin-4-one
• 英文别名: 6-Aethyl-5-methyl-2-thioxo-2,3-dihydro-1H-pyrimidin-4-on；5-Methyl-6-ethyl-2-thiouracil；6-Ethyl-5-methyl-2-sulfanylidene-1,2,3,4-tetrahydropyrimidin-4-one；6-ethyl-5-methyl-2-sulfanylidene-1H-pyrimidin-4-one
• CAS: 54089-08-6
• 化学式: C₇H₁₀N₂OS
• 分子量: 170.235
• InChiKey: DAWYXMLSWCGCEP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.43
• 拓扑面积：
  73.2
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  2-甲基-3-氧代戊酸乙酯 、 硫脲 在 sodium ethanolate 作用下， 生成 6-ethyl-5-methyl-2-thioxo-2,3-dihydro-1H-pyrimidin-4-one
  参考文献：
  名称：

  化疗研究；抗甲状腺化合物；由β-氧酸酯和硫脲合成5-和6​​-取代的2-硫尿嘧啶。

  摘要：

  DOI：

  10.1021/ja01228a042

文献信息

• Positive working photosensitive material
  申请人：AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.

  公开号：US10976662B2

  公开（公告）日：2021-04-13

  The present application for patent relates to a light-sensitive positive working photosensitive composition especially useful for imaging thick films using a composition which gives very good film uniformity and promotes a good process latitude against feature pattern collapse in patterns created upon imaging and developing of these films.

  本专利申请涉及一种感光性正片工作感光组合物，特别适用于厚膜成像，该组合物可提供非常好的胶片均匀性，并在这些胶片成像和显影过程中，促进良好的加工纬度，防止图案特征崩溃。
• Studies in Chemotherapy. X. Antithyroid Compounds. Synthesis of 5- and 6- Substituted 2-Thiouracils from β-Oxoesters and Thiourea¹
  作者：George W. Anderson、I. F. Halverstadt、Wilbur H. Miller、Richard O. Roblin

  DOI：10.1021/ja01228a042

  日期：1945.12
• POSITIVE WORKING PHOTOSENSITIVE MATERIAL
  申请人：AZ Electronic Materials (Luxembourg) S.à.r.l.

  公开号：EP3446180B1

  公开（公告）日：2020-04-01
• CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD FOR MANUFACTURING PLATED ARTICLE
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20190278178A1

  公开（公告）日：2019-09-12

  A chemically amplified positive-type photosensitive resin composition capable of forming a resist pattern having excellent cross-sectional perpendicularity of a nonresist section even when a resist pattern is formed on a metal surface, and a method for manufacturing a substrate with a template and a method for manufacturing a plated article using the composition. The composition contains an acid generator, a resin, and a sulfur-containing compound including a sulfur-containing compound and a thiol compound that is different from the sulfur-containing compound.
• Vanderhaeghe, Bulletin des Societes Chimiques Belges, 1950, vol. 59, p. 689
  作者：Vanderhaeghe

  DOI：——

  日期：——