Octan-4-yloxymethylbenzene | 87220-51-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Octan-4-yloxymethylbenzene
• 英文别名: octan-4-yloxymethylbenzene
• CAS: 87220-51-7
• 化学式: C₁₅H₂₄O
• 分子量: 220.355
• InChiKey: KLSJAOCIQIUUPZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.7
• 重原子数：
  16
• 可旋转键数：
  8
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.6
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  4-辛醇 、 氯化苄 在 zeolite 作用下， 以 正己烷 为溶剂， 反应 100.0h， 以40%的产率得到Octan-4-yloxymethylbenzene
  参考文献：
  名称：

  Zeolite-Promoted Benzylation of Alcohols

  摘要：

  沸石促进的苯甲基氯与醇的苄基化反应已被研究。通过使用一系列阳离子交换的沸石，这些沸石具有相同的晶体结构但不同的酸碱性质，证实了尽管酸和碱的强度较低，但沸石的酸位点和碱位点的协同作用对于醇的有效苄基化反应是必要的。还发现，由于苄基化反应在沸石的狭窄孔道内得到促进，醇在沸石中的反应活性与在溶液中不同，这取决于它们的分子结构。

  DOI：

  10.1246/bcsj.59.1761

文献信息

• BENZYLATION OF ALCOHOLS TO BENZYL ETHERS WITH ALKALI CATION EXCHANGED Y TYPE ZEOLITE
  作者：Makoto Onaka、Motomitsu Kawai、Yusuke Izumi

  DOI：10.1246/cl.1983.1101

  日期：1983.7.5

  Benzylation of alcohols with benzyl chloride is found to proceed efficiently in the presence of alkali cation exchanged Y type zeolite in a non-polar solvent under neutral conditions. The effects of solvent and alkali cation of zeolite are studied.

  在非极性溶剂中，中性条件下，碱性阳离子交换Y型沸石的存在使得苯甲基氯化物对醇的苄基化反应高效进行。研究了溶剂和沸石的碱性阳离子的影响。
• [EN] A METHOD FOR THE PREPARATION OF FINGOLIMOD<br/>[FR] PROCÉDÉ DE PRÉPARATION DE FINGOLIMOD
  申请人：ZENTIVA KS

  公开号：WO2013185740A1

  公开（公告）日：2013-12-19

  The invention relates to a method of preparation of 2-amino-2-[2-(4-octylphenyl)- ethyl]propane-1,3-diol (I), comprising opening of the aziridine ring of the intermediates (LVI) by the treatment with organometallic compounds, preferably the Grignard reagents (LVII), producing the key intermediates (LVIII) or (LIX). Another object of the invention is use of the compounds (LVIII) and (LIX) for preparation of fingolimod.

  这项发明涉及一种制备2-氨基-2-[2-(4-辛基苯基)-乙基]丙烷-1,3-二醇（I）的方法，包括通过与有机金属化合物（优选为格氏试剂（LVII））处理中间体（LVI）来打开环氮丙烷环，生成关键中间体（LVIII）或（LIX）。该发明的另一个目的是利用化合物（LVIII）和（LIX）来制备非格列酮。
• CURABLE COMPOSITION FOR IMPRINTS, CURED PRODUCT, PATTERN FORMING METHOD, LITHOGRAPHY METHOD, PATTERN AND LITHOGRAPHY MASK
  申请人：FUJIFILM Corporation

  公开号：US20180037688A1

  公开（公告）日：2018-02-08

  Provided are a curable composition for imprints which is capable of both improving releasability and suppressing occurrence of waviness during etching, as well as a cured product, a pattern forming method, a lithography method, a pattern, and a lithography mask, each of which uses the curable composition for imprints. The curable composition for imprints includes a monofunctional polymerizable compound, a polyfunctional polymerizable compound containing at least one of an alicyclic structure or an aromatic ring structure and having a viscosity at 25° C. of 150 mPa·s or less, and a photopolymerization initiator, in which the monofunctional polymerizable compound is contained in an amount of 5 to 30 mass % with respect to the total polymerizable compound in the curable composition for imprints, and the cured film of the curable composition for imprints has a modulus of elasticity of 3.5 GPa or less and a glass transition temperature of 90° C. or higher.