2-乙基金刚烷-2-基二环[2.2.1]庚-5-烯-2-甲酸酯 | 328087-87-2

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 中文名称: 2-乙基金刚烷-2-基二环[2.2.1]庚-5-烯-2-甲酸酯
• 中文别名: 5-降冰片烯-2-羧酸(2-乙基-2-金刚烷基)酯
• 英文名称: 2-ethyl-2-adamantyl 5-norbornene-2-carboxylate
• 英文别名: 2-ethyl-2-adamantyl 5-norbornen-2-carboxylate；2-Ethyladamantan-2-yl bicyclo[2.2.1]hept-5-ene-2-carboxylate；(2-ethyl-2-adamantyl) bicyclo[2.2.1]hept-5-ene-2-carboxylate
• CAS: 328087-87-2
• 化学式: C₂₀H₂₈O₂
• 分子量: 300.441
• InChiKey: WDKWRJUAIFFOII-UHFFFAOYSA-N

物化性质

• 沸点：
  389.1±21.0 °C(Predicted)
• 密度：
  1.13±0.1 g/cm3 (20 ºC 760 Torr)

计算性质

• 辛醇/水分配系数(LogP)：
  4.6
• 重原子数：
  22
• 可旋转键数：
  4
• 环数：
  6.0
• sp3杂化的碳原子比例：
  0.85
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

安全信息

• 海关编码：
  2916209090

文献信息

• Salt suitable for an acid generator and a chemically amplified resist composition containing the same
  申请人：Harada Yukako

  公开号：US20070078269A1

  公开（公告）日：2007-04-05

  The present invention provides a salt of the formula (I): wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH 2 — group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q 1 and Q 2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A + represents organic counter ion; and n shows an integer of 0 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

  本发明提供了一种具有公式(I)的盐： 其中环Y代表具有3至30个碳原子的单环或多元环烃基团，其中一个—CH2—基团被—COO—基团取代，并且单环或多元环烃基团中的至少一个氢原子可以可选地被具有1至6个碳原子的烷基取代，具有1至6个碳原子的烷氧基，具有1至4个碳原子的全氟烷基，具有1至6个碳原子的羟基烷基，羟基或腈基；Q1和Q2各自独立地代表氟原子或具有1至6个碳原子的全氟烷基；A+代表有机反离子；n表示0至12的整数。 本发明还提供了一种含有公式(I)盐的化学放大抗蚀剂组合物。
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：ICHIKAWA Koji

  公开号：US20100304293A1

  公开（公告）日：2010-12-02

  A salt represented by the formula (a): wherein Q 1 and Q 2 each independently represent a fluorine atom etc., X 1 represents a single bond etc., X 2 represents a single bond etc., Y 1 represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X 2 —Y 1 group has one or more fluorine atoms, and Z + represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

  由公式(a)表示的盐：其中Q1和Q2各自独立代表氟原子等，X1代表单键等，X2代表单键等，Y1代表C3-C6的脂环烃基等，但条件是—X2—Y1基团具有一个或多个氟原子，以及Z+代表有机反离子，以及包含由公式(a)表示的盐的光阻剂组合物和包含具有酸不稳定的基团并且在水性碱液中不溶或微溶于但在酸性作用下水性碱液中变得可溶的树脂的结构单元。
• SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160052877A1

  公开（公告）日：2016-02-25

  A salt represented by the formula (I); wherein Q 1 and Q 2 each independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, L b1 represents a single bond or a divalent C 1 to C 24 saturated hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C 3 to C 18 alicyclic hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C 6 to C 20 aromatic hydrocarbon group, and Z + represents an organic sulfonium cation or an organic iodonium cation.

  根据您的要求，以下是化合物的中文翻译： 由公式(I)表示的盐； 其中Q1和Q2各自独立代表一个氟原子或一个C1至C6的过氟代烷基团，Lb1代表一个单键或一个二价的C1至C24的饱和烃基团，其中甲基烯基团可以被一个氧原子或一个羰基团所取代，并且其中氢原子可以被一个羟基或一个氟原子所取代，并且Y代表一个氢原子，一个氟原子，或一个可选地被取代的C3至C18的芳环烃基团，其中甲基烯基团可以被一个氧原子，一个羰基团或一个磺酰基团所取代；并且Ar代表一个二价的C6至C20的芳香烃基团，以及Z+代表一个有机硫正离子或一个有机碘正离子。
• SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160200702A1

  公开（公告）日：2016-07-14

  A salt represented by the formula (I): wherein R 1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q 1 and Q 2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A 1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R 2 represents an acid-labile group; and “m” represents an integer of 0 to 3.

  由公式(I)表示的盐： 其中 R1 代表一个C1至C12的烷基，其中一个亚甲基基团可以被一个氧原子或一个羰基团所取代； Q1 和 Q2 各自独立地代表一个氟原子或一个C1至C6的全氟烷基团； A1 代表一个含有内酯环的基团，该基团有4到24个碳原子； R2 代表一个酸不稳定的基团；并且 “m”代表一个0到3之间的整数。
• Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Shigematsu Junji

  公开号：US20080086014A1

  公开（公告）日：2008-04-10

  The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH 2 — in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH 2 — in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A + represents an organic counter ion.

  本发明提供了一种由公式(I)表示的盐：其中X代表含至少一个二价脂环烃基的C3-C30二价基团，并且C3-C30二价基团中的至少一个—CH2—可以被—O—或—CO—取代，Y代表一个C3-C30环烃基，该环烃基可以至少被选自C1-C6烷氧基、C1-C4全氟烷基、C1-C6羟基烷基、羟基和氰基的至少一个取代基取代，并且C3-C30环烃基中的至少一个— —可以被—O—或—CO—取代，Q1和Q2各自独立地代表一个氟原子或一个C1-C6全氟烷基，以及A+代表一个有机反离子。