N-containing heterocyclic compounds, processes for the preparation thereof and composition comprising the same
申请人:FUJISAWA PHARMACEUTICAL CO., LTD.
公开号:EP0228845A2
公开(公告)日:1987-07-15
An N-containing heterocyclic compound of the formula: I
wherein R' is lower alkyl optionally substituted with hydroxy, halogen or a heterocyciic group, carboxy, esterified carboxy, carbamoyl optionally substituted with heterocyclic(lower)alkyl or lower alkylamino(lower)alkyl, N-containing heterocycliccarbonyl optionally substituted with lower alkyl, or ureido optionally substituted with lower alkylamino(lower)alkyl, and
R3 is hydrogen or halogen;
R2 is phenyl substituted with nitro, and
X is = N-or
in which R' is lower alkyl or halo (lower) alkyl, or is taken together with R' to form an N-containing heterocyclic group optionally substituted with oxo and lower alkylamino(lower)alkyl; or
R2 is lower alkyl, and
X is
in which R4 is phenyl substituted with nitro;
and a pharmaceutically acceptable salt thereof, processes for the preparation thereof and composition comprising the same.
式中的含 N 杂环化合物:I
其中 R'是任选被羟基、卤素或杂环基取代的低级烷基、羧基、酯化羧基、任选被杂环(低级)烷基或低级烷基氨基(低级)烷基取代的氨基甲酰基、任选被低级烷基取代的含 N 杂环羰基或任选被低级烷基氨基(低级)烷基取代的脲基,以及
R3 是氢或卤素;
R2 是被硝基取代的苯基,以及
X 是 = N-or
其中 R'是低级烷基或卤代(低级)烷基,或与 R'一起形成可选被氧代和低级烷基氨基(低级)烷基取代的含 N 杂环基团;或
R2 是低级烷基,且
X 是
其中 R4 是被硝基取代的苯基;
及其药学上可接受的盐、制备工艺和包含这些成分的组合物。