申请人:NIPPON SODA CO., LTD.
公开号:EP1482361A1
公开(公告)日:2004-12-01
It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I):
wherein R1 and R2 independently represent hydrogen atom, halogen atom, C1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(=O)R4 group, S(O)nR4 group, P(=O)(R4)2 group or M(R4)3 group; R3 represents C1-20 hydrocarbon group or a heterocyclic group: R4 represents C1-20 hydrocarbonoxy group, C1-20 hydrocarbon group, C1-20 hydrocarbonthio group or mono- or di- C1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2, and an acid or a compound capable of generating an acid in response to an external stimulus.
本发明旨在提供用于抗蚀剂等的组合物,通过增大暴露部分和未暴露部分之间的溶解度差异,形成具有高灵敏度和高分辨率的精细图案。可酸性降解组合物含有一种聚合物,其重复单元由以下通式 (I) 表示:
其中 R1 和 R2 分别代表氢原子、卤素原子、C1-20 烃基、杂环基、氰基、硝基、C(=O)R4 基、S(O)nR4 基、P(=O)(R4)2 基或 M(R4)3 基;R3 代表 C1-20 烃基或杂环基:R4代表C1-20烃氧基、C1-20烃基、C1-20烃硫基或单-或双-C1-20烃氨基;M代表硅、锗、锡或铅原子;n为0、1或2。