4,4'-diazidodiphenyl sulfide | 6427-97-0

• 分子结构分类: 有机化合物 - 有机硫化合物 - 硫醚类
• 英文名称: 4,4'-diazidodiphenyl sulfide
• 英文别名: 1-azido-4-[(4-azidophenyl)sulfanyl]benzene；bis-(4-azido-phenyl)-sulfide；Bis-(4-azido-phenyl)-sulfid；1,1'-Sulfanediylbis(4-azidobenzene)；[[4-[(4-diazonioiminocyclohexa-2,5-dien-1-ylidene)-λ4-sulfanylidene]cyclohexa-2,5-dien-1-ylidene]hydrazinylidene]azanide
• CAS: 6427-97-0
• 化学式: C₁₂H₈N₆S
• 分子量: 268.302
• InChiKey: IJVLOKVOTHKDOK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  19
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  67.2
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  4,4'-diazidodiphenyl sulfide 以 various solvent(s) 为溶剂， 生成 4,4'-dinitrenodiphenyl sulfide
  参考文献：
  名称：

  ESR Study of Intramolecular Magnetic Interactions in Bis(nitrenophenyl) Sulfides

  摘要：

  在4,4′-二叠氮双苯硫光解过程中观察到了五重态ESR峰，这些信号强度与温度的关系图符合居里定律，尽管在4,4′-二叠氮双苯醚的光解中没有观察到五重态信号。在照射3,4′-二叠氮双苯硫时，ESR谱显示了3,4′-二硝基双苯硫的五重态共振。居里分析和PM3-CI计算均表明，五重态是基态。

  DOI：

  10.1246/cl.1994.1679
• 作为产物：
  描述：

  4,4-二氨基二苯硫醚 在 亚硝酸特丁酯 、 叠氮基三甲基硅烷 作用下， 以 乙腈 为溶剂， 以82 %的产率得到4,4'-diazidodiphenyl sulfide
  参考文献：
  名称：

  在环境条件下通过叠氮化物单体的区域选择性点击聚合将惰性腈有效转化为多官能聚（5-氨基-1,2,3-三唑）

  摘要：

  腈化合物是丰富、稳定、廉价且容易获得的天然和化学工业来源。然而，由于其惰性反应活性，腈单体向功能聚合物的有效转化大多受到限制，在非常温和的条件下开发基于腈单体的高效聚合仍然是一个巨大的挑战。在这项工作中，在环境条件下成功建立了一种简单而强大的碱催化乙腈-叠氮化物点击聚合反应。该聚合还具有反应时间短（15分钟）、100%原子经济性、无过渡金属催化剂体系和区域选择性等优点。一系列具有高重均分子量（ Mw ，高达204,000）的聚（5-氨基-1,2,3-三唑）（PATA）以优异的产率（高达99%）生产出来。含有四苯乙烯 (TPE) 部分的 PATA 表现出独特的聚集诱导发射 (AIE) 特性，可用于以低检测限 (1.205 × 10 –7 M) 灵敏地检测 Fe(III) 离子，并对溶酶体进行特异性成像活细胞。值得注意的是，PATA 由于其聚合物链中含有伯氨基，甚至可以通过一锅串联反应轻松进行

  DOI：

  10.1021/jacs.3c12588

文献信息

• Hydrofluoroalkanesulfonic acids from fluorovinyl ethers
  申请人：Junk P. Christopher

  公开号：US20060276670A1

  公开（公告）日：2006-12-07

  Hydrofluoroalkanesulfonates of the general formula R—O—CXH—CX 2 —SO 3 M, where R is selected from the group consisting of alkyl groups, functionalized alkyl groups, and alkenyl groups; X is selected from the group consisting of hydrogen and fluorine with the proviso that at least one X is fluorine; and M is a cation, are made by reacting fluorovinyl ether with aqueous sulfite solution. Organic onium hydrofluoroalkanesulfonates are useful as ionic liquids and photoacid generators.

  通式为R—O—CXH—CX2—SO3M的氢氟烷磺酸盐，其中R选自烷基、官能化烷基和烯基组成的群；X选自氢和氟，但至少有一个X为氟；M为阳离子。通过将氟乙烯醚与含有亚硫酸盐的水溶液反应制备有机铵氢氟烷磺酸盐，这些化合物可用作离子液体和光酸发生剂。
• Photoresists, polymers and processes for microlithography
  申请人：——

  公开号：US20040023150A1

  公开（公告）日：2004-02-05

  Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresists comprise a fluorine-containing copolymer comprising a repeat unit derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group selected from the group consisting of fluorine atom, perfluoroalkyl group, and perfluoroalkoxy group, characterized in that the at least one atom or group is covalently attached to a carbon atom which is contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one covalently attached carbon atom. The photoresists have high transparency in the extreme/far UV as well as the near UV, high plasma etch resistance, and are useful for microlithography in the extreme, far, and near ultraviolet (UV) region, particularly at wavelengths ≦365 nm. Novel fluorine-containing copolymers are also disclosed.

  本文揭示了用于极端、远红外和近紫外微影的光阻及相关工艺。在某些实施例中，光阻包括（a）含有氟的共聚物，包括至少一个乙烯基不饱和化合物的重复单元，其特征在于至少一个乙烯基不饱和化合物是多环的，至少一个乙烯基不饱和化合物含有至少一个氟原子共价连接到一个乙烯基不饱和碳原子上；以及（b）至少一个光敏组分。在其他实施例中，光阻包括含有氟的共聚物，包括至少一个多环乙烯基不饱和化合物的重复单元，该乙烯基不饱和化合物具有至少一个来自氟原子、全氟烷基和全氟烷氧基的原子或基团，其特征在于至少一个原子或基团共价连接到一个环结构内的碳原子上，并且与每个乙烯基不饱和碳原子之间至少有一个共价连接的碳原子相隔开。这些光阻在极端/远红外和近紫外具有高透明度，高等离子体蚀刻抗性，并且适用于极端、远红外和近紫外（UV）区域的微影，特别是在波长≤365 nm的情况下。此外，还揭示了新型含氟共聚物。
• Hydrophilic polymer having silane coupling group terminal and lithographic printing plate base
  申请人：——

  公开号：US20020134266A1

  公开（公告）日：2002-09-26

  A polymer compound includes i) a polymerization unit represented by —(CHR 3 —CR 4 (—L 1 —Y 1 )) x —(CHR 5 —CR 6 (—L 2 —Y 2 )) y —; and ii) a silane coupling group represented by —S—(CH 2 ) n —Si—(R 1 ) m (OR 2 ) 3-m , as a terminal of the polymer, wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , n, x, y, L 1 , L 2 , Y 1 and Y 2 are defined in the specification. A lithographic printing plate base includes: a support; and a hydrophilic layer containing solid particles to a surface of which a hydrophilic polymer is chemically bonded.

  一种聚合物化合物包括i）由—（CHR3—CR4（—L1—Y1））x—（CHR5—CR6（—L2—Y2））y—表示的聚合单元；和ii）由—S—（CH2）n—Si—（R1）m（OR2）3-m表示的硅烷偶联基，作为聚合物的末端，其中R1、R2、R3、R4、R5、R6、n、x、y、L1、L2、Y1和Y2在说明书中定义。一种光刻印版基材包括：支撑；和含有固体颗粒的亲水层，其表面化学键合了亲水性聚合物。
• Hydrofluoroalkanesulfonic Acids and Salts from Fluorovinyl Ethers
  申请人：JUNK CHRISTOPHER P.

  公开号：US20110039203A1

  公开（公告）日：2011-02-17

  Hydrofluoroalkanesulfonates of the general formula R—O—CXH—CX 2 —SO 3 M, where R is selected from the group consisting of alkyl groups, functionalized alkyl groups, and alkenyl groups; X is selected from the group consisting of hydrogen and fluorine with the proviso that at least one X is fluorine; and M is a cation, are made by reacting fluorovinyl ether with aqueous sulfite solution. Organic onium hydrofluoroalkanesulfonates are useful as ionic liquids and photoacid generators.

  通式为R—O—CXH—CX2—SO3M的氢氟烷基磺酸盐，其中R选择自烷基、官能化烷基和烯基组成的群体；X选择自氢和氟的群体，但至少一个X为氟；M是一个阳离子，通过将氟乙烯醚与水溶亚硫酸盐反应制备。有机阳离子氢氟烷基磺酸盐可用作离子液体和光酸发生剂。
• Radiation-sensitive composition and pattern-formation method using the same
  申请人：Hitachi, Ltd.

  公开号：EP0070198A1

  公开（公告）日：1983-01-19

  A radiation-sensitive composition comprising (i) an iodine-containing azide compound at least a part of which can be fixed substantially in a polymer by exposure to radiation and a polymer, or (ii) an azide compound, and an iodine compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer; and a said polymer substantially having compatibility with the azide compound in case (i) or the azide compound and the iodine compound in case (ii). This composition can be subjected to dry development with oxygen plasma after the exposure followed by heating, or it can be developed with an aqueous alkaline solution if the polymer is soluble therein.

  一种对辐射敏感的组合物，包括：(i) 含碘叠氮化合物，其中至少有一部分可通过辐射和聚合物的照射而基本固定在聚合物中，或 (ii) 叠氮化合物和碘化合物，其中至少有一部分可通过辐射和聚合物的照射而基本固定在聚合物中；以及所述聚合物与(i)情况下的叠氮化合物或(ii)情况下的叠氮化合物和碘化合物基本相容。这种组合物可以在曝光后用氧等离子体进行干显影，然后加热；如果聚合物可溶于碱性水溶液，也可以用碱性水溶液显影。