RESIST UNDERLAYER COMPOSITION, METHOD OF FORMING PATTERNS, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERN
申请人:CHEIL INDUSTRIES INC.
公开号:US20160041470A1
公开(公告)日:2016-02-11
Disclosed is a resist underlayer composition including a compound including a moiety represented by the following Chemical Formula 1 and a solvent.
In the above Chemical Formula 1,
A
1
to A
3
, X
1
, X
2
, L
1
, L
2
, Z, and m are the same as defined in the specification.
揭示了一种包括以下化学式1所代表的基团和溶剂的抗蚀底层组合物。在上述化学式1中,A1到A3、X1、X2、L1、L2、Z和m的定义与说明书中相同。