1-methylcyclopentanol benzoate | 88722-95-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1-methylcyclopentanol benzoate
• 英文别名: 1-methylcyclopentyl benzoate；(1-methylcyclopentyl) benzoate
• CAS: 88722-95-6
• 化学式: C₁₃H₁₆O₂
• 分子量: 204.269
• InChiKey: OVLAFJCMAIMVDV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.46
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  1-甲基环戊醇 在 正丁基锂 、 2,6-二甲基-2,5-环己二烯-1,4-二酮 作用下， 以 四氢呋喃 、 正己烷 、 二氯甲烷 为溶剂， 反应 16.0h， 生成 1-methylcyclopentanol benzoate
  参考文献：
  名称：

  2,6-二甲基-1,4-苯醌新型氧化还原缩合反应从大醇和羧酸制备各种羧酸酯

  摘要：

  使用 2,6-二甲基-1,4-苯醌 (DMBQ)、羧酸和原位形成的烷氧基二苯基膦 (1) 的新型氧化还原缩合反应顺利进行，得到相应的羧酸酯的产率很高。烷氧基二苯基膦是通过用伯醇或仲醇处理 N,N-二甲基氨基二苯基膦 (Ph2PNMe2) 或用伯醇、仲醇和叔醇的锂盐处理氯二苯基膦原位形成的。

  DOI：

  10.1246/cl.2003.300

文献信息

• Preparation of Various Carboxylic Acid Esters from Bulky Alcohols and Carboxylic Acids by a New Type Oxidation-reduction Condensation Using 2,6-Dimethyl-1,4-benzoquinone
  作者：Teruaki Mukaiyama、Wataru Kikuchi、Taichi Shintou

  DOI：10.1246/cl.2003.300

  日期：2003.3

  A new-type oxidation-reduction condensation by using 2,6-dimethyl-1,4-benzoquinone (DMBQ), carboxylic acids and in situ formed alkoxydiphenylphosphines (1) including the bulky alkoxy group-substituted ones proceeded smoothly to afford the corresponding carboxylic acid esters in good to high yields. Alkoxydiphenylphosphines were formed in situ by treating either N,N-dimethylaminodiphenylphosphine (Ph2PNMe2)

  使用 2,6-二甲基-1,4-苯醌 (DMBQ)、羧酸和原位形成的烷氧基二苯基膦 (1) 的新型氧化还原缩合反应顺利进行，得到相应的羧酸酯的产率很高。烷氧基二苯基膦是通过用伯醇或仲醇处理 N,N-二甲基氨基二苯基膦 (Ph2PNMe2) 或用伯醇、仲醇和叔醇的锂盐处理氯二苯基膦原位形成的。
• QUATERNARY AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20150357204A1

  公开（公告）日：2015-12-10

  A quaternary ammonium salt compound is represented by the following formula (A-1), wherein, R 1 , R 2 , and R 3 each represent an alkyl group, an alkenyl group, an aryl group, or an aralkyl group, a part or all of hydrogen atoms in these groups may be substituted by a hydroxyl group(s), an alkoxy group(s), or a halogen atom(s), and these groups may include one or more of a carbonyl group and an ester bond; R 4 represents a single bond, an alkylene group, an alkenylene group, an arylene group, or an aralkylene group, a part or all of hydrogen atoms in these groups may be substituted by an alkoxy group(s) or a halogen atom(s), and these groups may include one or more of an ether bond, a carbonyl group, an ester bond, and an amide bond; and A − represents a non-nucleophilic counter ion.

  一个四元铵盐化合物由以下式（A-1）表示，其中，R1、R2和R3分别代表烷基、烯基、芳基或芳基烷基，这些基团中的氢原子的一部分或全部可以被羟基、烷氧基或卤原子取代，这些基团中可能包括一个或多个羰基和酯键；R4代表一个单键、烷基、烯基、芳基或芳基烷基，这些基团中的氢原子的一部分或全部可以被烷氧基或卤原子取代，这些基团中可能包括一个或多个醚键、羰基、酯键和酰胺键；A−代表一个非亲核对离子。
• Benzoyl trifluoromethanesulphonate. A highly efficient benzoylating agent for sterically hindered hydroxy groups
  作者：Masato Koreeda、Lindsey Brown

  DOI：10.1039/c39830001113

  日期：——

  Reactions of benzoyl trifluoromethanesulphonate (BzOTf) with a variety of alcohols, including some with sterically hindered secondary and tertiary hydroxy goups, with phenolic compounds, and with 1,2-diols at low temperatures provide the corresponding benzoates in high yield.

  苯甲酰基三氟甲磺酸酯（BzOTf）与多种醇（包括一些具有空间位阻的仲和叔羟基基团），酚类化合物和1,2-二醇在低温下的反应可提供高收率的相应苯甲酸酯。
• Direct formation of functionalized ketones via the coupling of functionalized organocopper reagents with acid chlorides
  作者：Richard M. Wehmeyer、Reuben D. Rieke

  DOI：10.1016/s0040-4039(00)80534-1

  日期：1988.1

  reactive copper solutions have been prepared by the lithium naphthalide reduction of a copper(I) iodide/triphenyl-phosphine complex. These copper solutions react rapidly with functionalized alkyl halides to give organocopper reagents which have been effectively trapped with acid chlorides giving functionalized ketones in good yields. Ester, nitrile, chloride, remote epoxide, and, to some degree, ketone groups

  通过将碘化亚铜（I）/三苯基-膦配合物进行萘锂的还原，已经制备了高反应性的铜溶液。这些铜溶液与官能化的烷基卤化物迅速反应，生成有机铜试剂，有机铜试剂已被酰基氯有效地捕集，从而以良好的收率得到官能化的酮。这种方法可以耐受酯，腈，氯，远端环氧化物以及一定程度上的酮基。
• Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2826826A1

  公开（公告）日：2015-01-21

  The present invention provides a composition for forming a coating type BPSG film, which comprises: one or more structures comprising a silicic acid represented by the following general formula (1) as a skeletal structure, one or more structures comprising a phosphoric acid represented by the following general formula (2) as a skeletal structure and one or more structures comprising a boric acid represented by the following general formula (3) as a skeletal structure. There can be provided a composition for forming a coating type BPSG film which is excellent in adhesiveness in fine pattern, can be easily wet etched by a peeling solution which does not cause any damage to the semiconductor apparatus substrate, the coating type organic film or the CVD film mainly comprising carbon which are necessary in the patterning process, and can suppress generation of particles by forming it in the coating process.

  本发明提供了一种用于形成涂层型 BPSG 薄膜的组合物，该组合物包括：由以下通式 (1) 所代表的硅酸作为骨架结构的一种或多种结构、由以下通式 (2) 所代表的磷酸作为骨架结构的一种或多种结构以及由以下通式 (3) 所代表的硼酸作为骨架结构的一种或多种结构。本发明可提供一种用于形成涂层型 BPSG 薄膜的组合物，该组合物在精细图案方面具有优异的粘附性，可通过剥离溶液轻松进行湿蚀刻，不会对半导体设备基板、涂层型有机薄膜或图案化过程中所需的主要由碳构成的 CVD 薄膜造成任何损害，并且通过在涂层过程中形成该组合物，可抑制颗粒的生成。