methyl dibenzo[b,d]furan-3-carboxylate | 92151-88-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并呋喃
• 英文名称: methyl dibenzo[b,d]furan-3-carboxylate
• 英文别名: Methyl dibenzofuran-3-carboxylate
• CAS: 92151-88-7
• 化学式: C₁₄H₁₀O₃
• 分子量: 226.232
• InChiKey: HRCOBAOPENGSSO-UHFFFAOYSA-N

物化性质

• 沸点：
  361.4±15.0 °C(Predicted)
• 密度：
  1.268±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  17
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  39.4
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  methyl dibenzo[b,d]furan-3-carboxylate 在 吡啶 、 sodium tetrahydroborate 、 nickel(II) chloride hexahydrate 、 硝酸 、 1-羟基苯并三唑 、 N,N'-二环己基碳二亚胺 、 三氟乙酸 、 sodium hydroxide 作用下， 以 甲醇 、 水 、 N,N-二甲基甲酰胺 为溶剂， 反应 37.5h， 生成
  参考文献：
  名称：

  7-Amino-dibenzofuran-3-carboxylate: A new probe for femtosecond dynamic microsolvation studies of biomolecules

  摘要：

  The reorientational dynamics of a polar environment, for example water in the hydration shell of biomolecules, can be measured with a molecular probe by time-resolving its fluorescence Stokes shift. The new probe 7-amino-dibenzofuran-3-carboxylate (ADC) was designed and synthesized for such use in double-stranded DNA where it may replace a base pair. This contribution concentrates on the synthesis, including the DNA bulding block, and on the radiative properties of the chromophore independent of the biomolecule. The X-ray diffraction structure and radiative properties are compared to ab-initio quantum-computational predictions. After pi pi* excitation near 330 nm in acetonitrile, the dynamic Stokes shift is followed by femtosecond transient absorption around 445 nm, at the red half-point of a strong excited-state-absorption band. Polar solvation dynamics is reported faithfully by this chromophore. (c) 2012 Elsevier B.V. All rights reserved.

  DOI：

  10.1016/j.jphotochem.2012.02.015
• 作为产物：
  描述：

  二苯并呋喃 在 potassium cyanide 、 sodium tetrahydroborate 、 tetrafluoroboric acid 、 亚硝酸特丁酯 、 nickel(II) chloride hexahydrate 、 硫酸 、 硝酸 、 三氟乙酸 、 potassium hydroxide 作用下， 以 甲醇 、 水 、 乙腈 为溶剂， 反应 18.5h， 生成 methyl dibenzo[b,d]furan-3-carboxylate
  参考文献：
  名称：

  7-Amino-dibenzofuran-3-carboxylate: A new probe for femtosecond dynamic microsolvation studies of biomolecules

  摘要：

  The reorientational dynamics of a polar environment, for example water in the hydration shell of biomolecules, can be measured with a molecular probe by time-resolving its fluorescence Stokes shift. The new probe 7-amino-dibenzofuran-3-carboxylate (ADC) was designed and synthesized for such use in double-stranded DNA where it may replace a base pair. This contribution concentrates on the synthesis, including the DNA bulding block, and on the radiative properties of the chromophore independent of the biomolecule. The X-ray diffraction structure and radiative properties are compared to ab-initio quantum-computational predictions. After pi pi* excitation near 330 nm in acetonitrile, the dynamic Stokes shift is followed by femtosecond transient absorption around 445 nm, at the red half-point of a strong excited-state-absorption band. Polar solvation dynamics is reported faithfully by this chromophore. (c) 2012 Elsevier B.V. All rights reserved.

  DOI：

  10.1016/j.jphotochem.2012.02.015

文献信息

• Oxidative α-C–C Bond Cleavage of 2° and 3° Alcohols to Aromatic Acids with O₂ at Room Temperature via Iron Photocatalysis
  作者：Zongnan Zhang、Guoxiang Zhang、Ni Xiong、Ting Xue、Junjie Zhang、Lu Bai、Qinyue Guo、Rong Zeng

  DOI：10.1021/acs.orglett.1c00556

  日期：2021.4.16

  cleavage of unfunctionalized secondary (2°) and tertiary alcohols (3°) is essential for valorization of macromolecules and biopolymers. We developed a blue-light-driven iron catalysis for aerobic oxidation of 2° and 3° alcohols to acids via α-C–C bond cleavages at room temperature. The first example of oxygenation of the simple tertiary alcohols was reported. The iron catalyst and blue light play critical

  未官能化的仲醇（2°）和叔醇（3°）的选择性α-CC键断裂对于大分子和生物聚合物的增值至关重要。我们开发了一种蓝光驱动的铁催化剂，用于在室温下通过α-CC键断裂将2°和3°醇有氧氧化为酸。报道了简单叔醇氧化的第一个例子。铁催化剂和蓝光起着至关重要的作用，可以使醇类形成高反应性的O自由基，并随后发生两次α-CC键断裂。
• Pd-Catalyzed Denitrative Intramolecular C–H Arylation
  作者：Kitty K. Asahara、Toshimasa Okita、Ami N. Saito、Kei Muto、Yoshiaki Nakao、Junichiro Yamaguchi

  DOI：10.1021/acs.orglett.9b01593

  日期：2019.6.21

  A Pd-catalyzed intramolecular C–H arylation of nitroarenes has been developed. Nitroarenes bearing tethered aryl groups at the ortho-position can be readily prepared in one step from 2-halonitroarenes by a nucleophilic aromatic substitution (SNAr). Under Pd/BrettPhos catalysis, activations of the C–NO2 bond as well as the C–H bond on arenes generated the corresponding biaryl linkage in moderate to

  已经开发了钯催化的硝基芳烃的分子内C–H芳基化反应。硝基芳烃轴承拴系的芳基在邻位-位可以在从2-halonitroarenes一个步骤通过亲核芳族取代（S容易地制备Ñ AR）。在Pd / BrettPhos催化下，芳烃上C–NO 2键以及C–H键的活化产生了相应的联芳基键合，产率中等至极佳。
• CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND
  申请人：OSAKA UNIVERSITY

  公开号：US20170052449A1

  公开（公告）日：2017-02-23

  A pattern-forming method comprises patternwise exposing a predetermined region of a resist material film made from a photosensitive resin composition comprising a chemically amplified resist material to a first radioactive ray that is ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to a second radioactive ray that is nonionizing radiation having a wavelength greater than the wavelength of the nonionizing radiation for the patternwise exposing and greater than 200 nm. The chemically amplified resist material comprises a base component, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The generative component comprises a radiation-sensitive sensitizer generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (A).

  一种图案形成方法包括将一种化学放大型光刻胶材料制成的感光树脂组成物的预定区域图案暴露于第一种放射性射线中，该放射性射线是电离辐射或波长不大于400 nm的非电离辐射。图案化暴露的光刻胶材料膜被洪水式暴露于第二种放射性射线中，该放射性射线是波长大于图案化暴露的非电离辐射的波长和大于200 nm的非电离辐射。该化学放大型光刻胶材料包括基础组分和能够在暴露时生成辐射敏感的敏化剂和酸的生成组分。生成组分包括辐射敏感的敏化剂生成剂。辐射敏感的敏化剂生成剂包括由式(A)表示的化合物。
• Chemically amplified resist material and resist pattern-forming method
  申请人：JSR CORPORATION

  公开号：US10018911B2

  公开（公告）日：2018-07-10

  A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid-and-sensitizer generating agent or the radiation-sensitive acid generating agent included in the generative component comprises the first compound that is radiation-sensitive and second compound that is radiation-sensitive. The first compound includes a first onium cation and a first anion, and the second compound includes a second onium cation and a second anion that is different from the first anion. Each of an energy released upon reduction of the first onium cation to a radical and an energy released upon reduction of the second onium cation to a radical is less than 5.0 eV.

  一种化学放大抗蚀剂材料包括一种在酸的作用下能溶于或不溶于显影液的聚合物成分，以及一种在曝光时能产生辐射敏感敏化剂和酸的生成成分。生成组件中的辐射敏感性酸和敏化剂生成剂或辐射敏感性酸生成剂包括辐射敏感性第一化合物和辐射敏感性第二化合物。第一化合物包括第一鎓阳离子和第一阴离子，第二化合物包括第二鎓阳离子和不同于第一阴离子的第二阴离子。第一鎓阳离子还原成自由基时释放的能量和第二鎓阳离子还原成自由基时释放的能量均小于 5.0 eV。
• Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting
  申请人：TOKYO ELECTRON LIMITED

  公开号：US10025187B2

  公开（公告）日：2018-07-17

  A photosensitization chemical-amplification type resist material according to the present invention is used for a two-stage exposure lithography process, and contains (1) a developable base component and (2) a component generating a photosensitizer and an acid through exposure. Among three components consisting of (a) an acid-photosensitizer generator, (b) a photosensitizer precursor, and (c) a photoacid generator, the above component contains only the component (a), any two components, or all of the components (a) to (c).

  根据本发明，一种光敏化学放大型抗蚀剂材料用于两阶段曝光光刻工艺，它包含(1)可显影碱成分和(2)通过曝光产生光敏剂和酸的成分。在由(a)酸-光敏剂发生器、(b)光敏剂前体和(c)光酸发生器组成的三个组件中，上述组件只包含(a)组件、任意两个组件或(a)至(c)的所有组件。