申请人:Nitto Denko Corporation
公开号:EP1914284A1
公开(公告)日:2008-04-23
An adhesive sheet for processing semiconductor wafers and / or substrates comprises a UV- and/or radiation-transmittable base film and an adhesive layer that undergoes a polymerization curing reaction by means of UV rays and/or radiation, wherein the adhesive layer comprises at least a tackifier and a surfactant. The adhesive sheet of the present invention can be to lower the adhesive strength to the optimal level during pick up or the like after irradiation with UV rays and/or radiation, while maintaining adhesion with adherends before irradiation with UV rays and/or radiation by ensuring that, regardless of the texture on the surface of adherends such as semiconductor wafers and/or substrates, the adhering surface favorably conforms to the texture with preserving enough adhesive and cohesive strength.
一种用于加工半导体晶片和/或基片的粘合片包括可透过紫外线和/或辐射的基膜和通过紫外线和/或辐射进行聚合固化反应的粘合层,其中粘合层至少包括增粘剂和表面活性剂。本发明的粘合剂片材可以在紫外线和/或辐射照射后的拾取或类似拾取过程中将粘合强度降低到最佳水平,同时在紫外线和/或辐射照射前保持与被粘物的粘合力,确保无论半导体晶片和/或基板等被粘物表面的纹理如何,粘合表面都能在保持足够的粘合力和内聚力的情况下与纹理保持良好的吻合。