4-(9-anthracenyl)-butanol | 138925-69-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 4-(9-anthracenyl)-butanol
• 英文别名: 4-(9-Anthracenyl)butanol；4-(Anthracen-9-YL)butan-1-OL；4-anthracen-9-ylbutan-1-ol
• CAS: 138925-69-6
• 化学式: C₁₈H₁₈O
• 分子量: 250.34
• InChiKey: XBMJVUQZFZADHA-UHFFFAOYSA-N

物化性质

• 沸点：
  459.1±24.0 °C(Predicted)
• 密度：
  1.132±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5
• 重原子数：
  19
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.22
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  4-(9-anthracenyl)-butanol 在 盐酸 、 sodium hydride 作用下， 以 甲醇 、 N,N-二甲基甲酰胺 为溶剂， 反应 25.0h， 生成 4-(9-anthracenyl)-butyl-hexaethylene glycol
  参考文献：
  名称：

  RNA 活性位点的表征：Diels-Alderase 核酶与其底物和产物之间的相互作用

  摘要：

  最近已显示核酶催化小有机分子之间碳-碳键的立体选择性形成。这些 Diels-Alderase 核酶与其底物和产物的相互作用现已通过使用 44 种不同的、系统变化的类似物的化学取代分析得到阐明。RNA-二烯相互作用受堆叠相互作用控制，而氢键和金属离子配位似乎不太重要。二烯必须是蒽衍生物，并且允许在指定位置上有取代基，从而揭示结合位点的几何形状。亲二烯体必须是具有未取代反应性双键的五元马来酰亚胺环，疏水侧链对 RNA 结合有重要贡献。核酶区分手性底物的不同对映异构体，并以对映选择性和非对映选择性加速环加成。反应的立体化学由 RNA-二烯相互作用控制。RNA 与环加成产物强烈且立体选择性地相互作用，需要存在几个结构特征。总之，结果突出了核酶活性位点的复杂性，它可以根据底物立体化学和取代模式的微小差异控制化学反应途径。需要存在几个结构特征。总之，结果突出了核酶活性位点的复杂性，它可以根据底物立体化

  DOI：

  10.1021/ja0167405
• 作为产物：
  描述：

  9-(4-羟基丁基)-9,10-二氢蒽 在 sulfur 作用下， 反应 8.0h， 以20%的产率得到4-(9-anthracenyl)-butanol
  参考文献：
  名称：

  Effenberger, Franz; Goetz, Guenther; Baeuerle, Peter, Chemische Berichte, 1992, vol. 125, # 4, p. 941 - 950

  摘要：

  DOI：

文献信息

• Dearomative Intramolecular (4+3) Cycloadditions of Arenes with Epoxy and Aziridinyl Enolsilanes
  作者：Jesse Ling、Sarah Lam、Kam-Hung Low、Pauline Chiu

  DOI：10.1002/anie.201704155

  日期：2017.7.17

  enolsilanes with benzene, naphthalene, and anthracene derivatives is reported. Highly functionalized polycyclic alcohols and amines are generated under relatively mild reaction conditions with yields up to 89 %. Optically enriched cycloadducts are obtained from cycloadditions of enantiomerically pure epoxides and aziridines.

  报道了环氧和叠氮基烯醇硅烷与苯，萘和蒽衍生物的分子内（4 + 3）环加成。在相对温和的反应条件下可以生成高度官能化的多环醇和胺，收率高达89％。光学富集的环加合物是从对映体纯的环氧化物和氮丙啶的环加成反应中获得的。
• Spin-on-glass anti-reflective coatings for photolithography
  申请人：——

  公开号：US20020095018A1

  公开（公告）日：2002-07-18

  Anti-reflective coating materials for ultraviolet photolithography include at least one organic light-absorbing compound incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining at least one organic absorbing compound with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.

  用于紫外光刻的防反射涂层材料包括至少一种有机吸光化合物，它被纳入旋涂玻璃材料中。适合的吸收化合物可以在365 nm、248 nm、193 nm和157 nm等可能用于光刻的波长范围内强烈吸收。制备吸收性旋涂玻璃材料的方法包括在旋涂玻璃材料的合成过程中将至少一种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物结合。
• Spin-on anti-reflective coatings for photolithography
  申请人：Kennedy T Joseph

  公开号：US20050058929A1

  公开（公告）日：2005-03-17

  Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. More specifically, the pH tuning agent strong influences the polymeric characteristics, the structural makeup and the spatial orientation that results in increasing the surface properties of the anti-reflective coating for optimal resist performance. In other words, a pH tuning agent that merely adjusts the pH of the spin-on material without influencing the mechanical properties and structural makeup of the spin-on composition or the coupled resist material is not contemplated herein. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.

  紫外光微影用的防反射涂层材料包括至少一个吸收化合物和至少一个pH调节剂，它们被并入旋涂材料中。适合的吸收化合物是那些在光刻中使用的波长范围内吸收的化合物，如365 nm、248 nm、193 nm和157 nm。适合的pH调节剂不仅可以调节最终旋涂组合物的pH值，还可以影响最终旋涂组合物的化学性能和特性、机械性能和结构构成，使最终的旋涂组合物更加兼容与其耦合的抗蚀材料、电子元件或半导体元件。更具体地说，pH调节剂强烈影响聚合物特性、结构构成和空间取向，从而增加防反射涂层的表面性能，以实现最佳的抗蚀性能。换句话说，仅仅调节旋涂材料的pH值而不影响旋涂组合物或耦合抗蚀材料的机械性能和结构构成的pH调节剂不在此范围内。制备吸收和pH调节旋涂材料的方法包括在旋涂材料和组合物的合成过程中将至少一个有机吸收化合物和至少一个pH调节剂与至少一个硅烷反应物结合。
• Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
  申请人：Kennedy Joseph

  公开号：US20080206690A1

  公开（公告）日：2008-08-28

  Compositions for use in tri-layer applications are described herein, wherein the composition has a matrix and includes: a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, at least one condensation catalyst, and at least one solvent. Tri-layer structures are also contemplated herein that comprise an organic underlayer (first layer), antireflective compositions and/or films contemplated herein (second layer) and a photoresist material (third layer) that are coupled to one another. Methods of producing a composition for tri-layer patterning applications includes: providing a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, providing at least one condensation catalyst, providing at least one solvent, providing at least one pH modifier, blending the formulated polymer and part of the at least one solvent in a reaction vessel to form a reactive mixture; and incorporating the at least one pH modifier, the at least one condensation catalyst and the remaining at least one solvent into the reactive mixture to form the composition.

  本文描述了用于三层应用的组合物，其中该组合物具有一个基质，包括：一种经过配制的聚合物，该聚合物的基质包含至少一种硅基基团，与基质相偶联的多个乙烯基和多个苯基，至少一种缩合催化剂和至少一种溶剂。本文还考虑了三层结构，包括有机底层（第一层）、反射率组合物和/或膜（第二层）以及与其相偶联的光阻材料（第三层）。制备用于三层图案应用的组合物的方法包括：提供一种经过配制的聚合物，该聚合物的基质包括至少一种硅基基团，与基质相偶联的多个乙烯基和多个苯基，提供至少一种缩合催化剂，提供至少一种溶剂，提供至少一种pH调节剂，将经过配制的聚合物和至少一部分溶剂混合在反应容器中形成反应混合物；并将至少一种pH调节剂、至少一种缩合催化剂和剩余的至少一种溶剂混入反应混合物中形成组合物。
• Spin-On Anti-Reflective Coatings for Photolithography
  申请人：Honeywell International Inc.

  公开号：US20130164677A1

  公开（公告）日：2013-06-27

  Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.

  紫外光微影的抗反射涂层材料包括至少一种吸收化合物和至少一种pH调节剂，它们被纳入到旋涂材料中。适合的吸收化合物是那些在365纳米、248纳米、193纳米和157纳米左右吸收的化合物，可用于光刻技术。适合的pH调节剂不仅可以调节最终旋涂组合物的pH值，还可以影响最终旋涂组合物的化学性能和特性、机械性能和结构组成，使最终旋涂组合物与与之耦合的抗性材料更加兼容。制备吸收和pH调节旋涂材料的方法包括在旋涂材料和组合物的合成过程中，将至少一种有机吸收化合物和至少一种pH调节剂与至少一种硅烷反应物结合。