申请人:Mitsui Chemicals Tohcello, Inc.
公开号:EP3546540A1
公开(公告)日:2019-10-02
An adhesive laminate film (50) of the present invention has a heat-resistant resin layer (10), a flexible resin layer (20), and an adhesive resin layer (30) in this order, a peel strength P0 between the heat-resistant resin layer (10) and the flexible resin layer (20), which is based on JIS Z0237 and measured using a method described below, is equal to or more than 0.01 N/25 mm and equal to or less than 2.0 N/25 mm, and a peel strength P1 between the heat-resistant resin layer (10) and the flexible resin layer (20) after a thermal treatment of the adhesive laminate film (50) at 160°C for four hours is equal to or more than 0.05 N/25 mm and equal to or less than 1.5 N/25 mm,
(method for measuring peel strength) the adhesive laminate film (50) is attached to a silicon wafer so that the adhesive resin layer (30) comes into contact with the silicon wafer. Next, the heat-resistant resin layer (10) is peeled off from the flexible resin layer (20) using a tensile tester in a 180-degree direction under conditions of 25°C and a tensile rate of 300 mm/minute, a strength (N/25 mm) at this time is measured twice, and an average value is regarded as the peel strength.
本发明的粘合层压膜(50)依次具有耐热树脂层(10)、柔性树脂层(20)和粘合树脂层(30),耐热树脂层(10)和柔性树脂层(20)之间的剥离强度 P0(基于 JIS Z0237 并使用下述方法测量)等于或大于 0.01 牛顿/25 毫米且等于或小于 2.0 牛顿/25 毫米,并且在 160°C 下对粘合层压膜 (50) 热处理四小时后,耐热树脂层 (10) 和柔性树脂层 (20) 之间的剥离强度 P1 等于或大于 0.05 牛顿/25 毫米且等于或小于 1.5 牛顿/25 毫米、
(测量剥离强度的方法)将粘合层压薄膜(50)贴在硅晶片上,使粘合树脂层(30)与硅晶片接触。然后,在 25°C 和拉伸速度为 300 毫米/分钟的条件下,使用拉伸试验机沿 180 度方向从柔性树脂层 (20) 上剥离耐热树脂层 (10),测量两次此时的强度(N/25 毫米),并将平均值视为剥离强度。