申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20160090355A1
公开(公告)日:2016-03-31
A sulfonium salt of formula (0-1) is provided wherein W is alkylene or arylene, R
01
is a monovalent hydrocarbon group, m is 0, 1 or 2, k is an integer: 0≦k≦5+4m, R
101
, R
102
and R
103
are a monovalent hydrocarbon group, or at least two of R
101
, R
102
and R
103
may bond together to form a ring with the sulfur atom, and L is a single bond, ester, sulfonic acid ester, carbonate or carbamate bond. A resist composition comprising the sulfonium salt as PAG exhibits a very high resolution when processed by EB and EUV lithography. A pattern with minimal LER is obtainable.
提供一种化学式为(0-1)的磺鎓盐,其中W是烷基或芳基,R01是一价碳氢基团,m为0、1或2,k为整数:0≦k≦5+4m,R101、R102和R103是一价碳氢基团,或者R101、R102和R103中至少两个可以相互结合形成与硫原子的环,L是单键、酯、磺酸酯、碳酸酯或氨基甲酸酯键。包含磺鎓盐作为PAG的抗蚀组成物在经过电子束或极紫外光刻过程时表现出非常高的分辨率。可获得具有最小LER的图案。