An organic polymer suitable for preparing optical waveguides or optical fibers and methods of making same are described. The polymer is a homo- or copolymer having an olefinic backbone with a pendant group comprising fluorinated aromatic and aliphatic moieties, and is cross-linkable. Polymers having refractive index over a wide range may be prepared by selecting specific constituents of the pendant group.
Polymeric Optical Waveguide
申请人:Petrucci-Samija Maria
公开号:US20080286580A1
公开(公告)日:2008-11-20
An organic polymeric optical waveguide or optical fiber and methods of making same are described herein. The waveguide can be used in an integrated optical waveguide device. The polymer is a homo- or copolymer having an olefinic backbone with a pendant group comprising fluorinated aromatic and aliphatic moieties, and is cross-linkable. Polymers having refractive index over a wide range may be prepared by selecting specific constituents of the pendant group thereby permitting the fabrication of optical waveguide tailored for a particular application.
Process for Preparing an Optical Organic Polymer
申请人:Petrucci-Samija Maria
公开号:US20080287624A1
公开(公告)日:2008-11-20
A process is provided for preparing an organic polymeric useful in the fabrication of optical waveguides or optical fiber. The polymer is a homo- or copolymer having an olefinic backbone with a pendant group comprising fluorinated aromatic and aliphatic moieties, and is cross-linkable. Polymers having refractive index over a wide range may be prepared by selecting specific constituents of the pendant group.
US7531620B2
申请人:——
公开号:US7531620B2
公开(公告)日:2009-05-12
Highly fluorinated low-molecular-weight photoresists for optical waveguides
negative‐type low‐molecular‐weight fluorinatedphotoresists (NFPs) were prepared by composing of fluorinated polystyrene derivates (FPSDs), diphenyl iodonium salt as a photoacid generator (PAG) and solvent. The polymer films prepared from NFP by photocuring exhibited excellent chemical resistance and thermal stabilities (Td ranged from 230.5 to 258.1 °C). A clear negative pattern was obtained through direct