tris(4-tert-butoxycarbonyloxyphenyl)sulfonium | 120397-65-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: tris(4-tert-butoxycarbonyloxyphenyl)sulfonium
• 英文别名: Tris[4-[(2-methylpropan-2-yl)oxycarbonyloxy]phenyl]sulfanium
• CAS: 120397-65-1
• 化学式: C₃₃H₃₉O₉S
• 分子量: 611.733
• InChiKey: RDCODPXHHPLMQI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  9
• 重原子数：
  43
• 可旋转键数：
  15
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  108
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  4,4'-二羟基二苯硫醚 在 potassium tert-butylate 作用下， 以 四氢呋喃 为溶剂， 生成 tris(4-tert-butoxycarbonyloxyphenyl)sulfonium
  参考文献：
  名称：

  三（4-叔丁氧基羰基氧基苯基）sulph盐的光解。机械研究

  摘要：

  用紫外线在乙腈或二甲基亚砜溶液中辐照结构为Ar 3 S + X –（X –：CF 3 SO 3 –或AsF 6 –）的三（4-叔丁氧基羰基氧基苯基））盐。通过离子对色谱（IPC），1 H NMR测量和红外光谱进行的产物分析表明，同时形成了双（4-叔丁氧基羰基氧基苯基）硫化物，Ar 2 S和质子酸（CF 3 SO 3 H或HAsF 6）。 。后者催化了在室温下在无水的情况下碳酸叔丁酯基团。在水的存在下，酸解离，从而形成H 3 O +离子，仅在升高的温度（T > 70°C）时才明显催化分解。因此，在无水条件下形成的光解产物除了（4-HO–C 6 H 4）2 S以外，还基本上由离子的盐混合物组成：Ar 2（4-HO–C 6 H 4）S +，Ar（4-HO–C 6 H 4）2 S +和（4-HO–C 6 H 4）3 S +。除了这些产品，（卜吨OCO 2 -C 6 H ^ 4）2 S和当在水的存在

  DOI：

  10.1039/p29910001803

文献信息

• POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN
  申请人：Nagai Tomoki

  公开号：US20100063232A1

  公开（公告）日：2010-03-11

  A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. wherein R 1 represents a hydrogen atom or the like, M + represents a specific cation, and n is an integer from 1 to 5.

  以下是翻译结果： 一种包括以下公式（10）所示的重复单元的树脂具有出色的辐射敏感酸发生剂性能，对环境和人体只有很小的负面影响。其中，R1代表氢原子或类似物，M+代表特定的阳离子，n为1至5的整数。
• COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：Ebata Takuma

  公开号：US20100221659A1

  公开（公告）日：2010-09-02

  A compound has a partial structure shown by a following formula (1), wherein R 1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R 2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents an integer from 0 to 10, and m represents an integer from 1 to 4.

  以下是化合物的部分结构式（1），其中R1代表氢原子或具有1至8个碳原子的取代或未取代的碳氢基团，R2代表具有1至8个碳原子的取代或未取代的碳氢基团，Rf代表氟原子或具有1至4个碳原子的全氟烷基团，L表示从0到4的整数，n表示从0到10的整数，m表示从1到4的整数。
• Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
  申请人：Ebata Satoshi

  公开号：US20070054214A1

  公开（公告）日：2007-03-08

  The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R 1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl, R 2 to R 4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.
• Novel Compound, Polymer, and Radiation-Sensitive Composition
  申请人：Nagai Tomoki

  公开号：US20090069521A1

  公开（公告）日：2009-03-12

  A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R 4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the R f s represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, M m+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION
  申请人：Tsuchimura Tomotaka

  公开号：US20100248149A1

  公开（公告）日：2010-09-30

  Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group.