Novel tetrahydrofuran compounds having alicyclic structure
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20020183529A1
公开(公告)日:2002-12-05
Tetrahydrofuran compounds of formula (1) wherein the broken line represents a single bond, a divalent organic group, or a structure in which the alicyclic structure in the form of norbornene or tetracyclo[4.4.0.1
2,5
.1
7,10
]dodecene and the tetrahydrofuran cyclic structure share one or two constituent carbon atoms, and k is 0 or 1 are novel and useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography.
1