Malonic acid diundecyl ester | 90256-23-8

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: Malonic acid diundecyl ester
• 英文别名: Diundecyl propanedioate
• CAS: 90256-23-8
• 化学式: C₂₅H₄₈O₄
• 分子量: 412.654
• InChiKey: LICACDNCTRZVDX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  10.2
• 重原子数：
  29
• 可旋转键数：
  24
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  对醛基苯甲酸 、 Malonic acid diundecyl ester 在 哌啶乙酸盐 作用下， 生成 2-(4-Carboxy-benzylidene)-malonic acid diundecyl ester
  参考文献：
  名称：

  Crystalline - Smectic C - Cubic - Isotropic - Nematic - Isotropic Polymorphism: Synthesis and Unexpected Behaviour of a New Series of Double-Swallow-Tailed Mesogens

  摘要：

  A new homologous series of six-ring double-swallow-tailed mesogens was prepared and investigated. Liquid-crystalline properties strongly depend on the length of the terminal alkyl chains. Six different phase sequences could be detected, two of them were unknown up to now. The derivatives DS-5...7 show smectic C, cubic and nematic phases, the longer-chain homologues DS-10...14, 16 have columnar phases. The substance DS-8 exhibits the most interesting phase sequence cr - S-C - cub - I-re - N - I. DS-8 represents the second pure compound with a stable reentrant isotropic phase. Optical, X-ray, and further investigations provide arguments to propose the structures of the different phases.

  DOI：

  10.1080/10587259508038689

文献信息

• Tantalum oxide film, use thereof, and method and composition for forming the same
  申请人：——

  公开号：US20030003235A1

  公开（公告）日：2003-01-02

  A composition for forming a high-quality tantalum film which is advantageously used as an capacitor insulating film and a process for forming the high-quality tantalum film. The composition for forming a tantalum oxide film, which comprises at least one tantalum compound selected from the group consisting of a reaction product of a compound capable of reacting with a tantalum alkoxide and a tantalum alkoxide and a hydrolyzate of the reaction product, and a solvent, and the process for forming the tantalum oxide film by applying this composition to a substrate and heating it.

  一种用于形成优质钽膜的组合物，该膜可作为电容器绝缘膜使用。用于形成氧化钽薄膜的组合物，其中包含至少一种钽化合物，该化合物选自由能与氧化钽烷氧基化合物和氧化钽烷氧基化合物反应的化合物的反应产物和该反应产物的水解物以及溶剂组成的组，以及将该组合物涂在基底上并加热以形成氧化钽薄膜的工艺。